Imaginary polarizing measuring method for simultaneously measuring the optical crystal thickness and the optic axis direction
| dc.citation.patentcountry | USA | zh_TW |
| dc.citation.patentnumber | 20050243326 | zh_TW |
| dc.contributor.author | Huang, Jung Y. | en_US |
| dc.contributor.author | Lee, Chien-Li | en_US |
| dc.date.accessioned | 2014-12-16T06:16:15Z | |
| dc.date.available | 2014-12-16T06:16:15Z | |
| dc.date.issued | 2005-11-03 | en_US |
| dc.description.abstract | The present invention provides an imaginary optical measuring method that can simultaneously obtain both the thickness of optical crystals and the optic axis direction. The method utilizes a same polarimetry system to perform the rotating measurement of the analyzer. Some images of light intensity variation corresponding to different azimuth positions of the analyzer are obtained, and these images are performed a curve-fitting process to get the projected optic axis direction that the optic axis projecting on the specimen plane. Next, the rotating measurement of the specimen is performed to continuously adjust incident angles of the polarized light, and the optic axis direction in 3-dimentional space and the 2-dimentional distribution of the thickness are measured. Hence, the present invention can obtain both the thickness of optical crystals and the optic axis direction with only one measurement structure, and effects of low-cost, economy, convenient measurement, and accuracy are achieved. | zh_TW |
| dc.identifier.govdoc | G01B009/02 | zh_TW |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/105723 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | Imaginary polarizing measuring method for simultaneously measuring the optical crystal thickness and the optic axis direction | zh_TW |
| dc.type | Patents | en_US |