Observation of a dominant EL2-like mid-gap trap in In0.12Ga0.88As/GaAs superlattice grown at low temperature by molecular beam epitaxy

dc.citation.epage6422en_US
dc.citation.issue11en_US
dc.citation.spage6421en_US
dc.citation.volume38en_US
dc.citation.woscount0
dc.contributor.authorChen, JFen_US
dc.contributor.authorWang, PYen_US
dc.contributor.authorWang, JSen_US
dc.contributor.authorWong, HZen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.date.accessioned2014-12-08T15:46:07Z
dc.date.available2014-12-08T15:46:07Z
dc.date.issued1999-11-01en_US
dc.description.abstractAdmittance spectroscopy is used to study a low-temperature (LT)-grown relaxed In0.12Ga0.88As/GaAs p-i-n superlattice. The capacitance-frequency spectra show two step-like trapping effects which are explained by the existence of two traps (E-a = 0.73 eV, sigma = 4.6 x 10(-11) cm(2) and E-a = 0.75 eV, sigma = 3.7 x 10(-15) cm(2)) in the LT-grown superlattice region. These two traps are the dominating defects observed in deep-level transient spectroscopy with one being a majority trap and the other being a minority trap. The emission parameters and photo-capacitance quenching effect for the 0.75 eV trap agree with those known for EL2 defects, suggesting that the EL2 defect is strongly enhanced in InGaAs/GaAs by LT growth.en_US
dc.identifier.issn0021-4922en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/31014
dc.identifier.wosnumberWOS:000084041800047
dc.language.isoen_USen_US
dc.subjectIn0.12Ga0.88As/GaAs superlatticeen_US
dc.subjectlow-temperature MBE growthen_US
dc.subjectdeep levelsen_US
dc.titleObservation of a dominant EL2-like mid-gap trap in In0.12Ga0.88As/GaAs superlattice grown at low temperature by molecular beam epitaxyen_US
dc.typeArticleen_US

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