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高頻功率氮化銦鋁/氮化鎵高電子遷移率電晶體技術開發與研究

dc.contributor.author張翼zh_TW
dc.contributor.authorCHANG EDWARD YIen_US
dc.contributor.department國立交通大學材料科學與工程學系(所)zh_TW
dc.date.accessioned2016-03-29T00:01:08Z
dc.date.available2016-03-29T00:01:08Z
dc.date.issued2016en_US
dc.description.sponsorship科技部zh_TW
dc.identifier.govdocMOST104-2221-E009-055-MY2zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=11712966&docId=477315en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/130823
dc.language.isozh_TWen_US
dc.title高頻功率氮化銦鋁/氮化鎵高電子遷移率電晶體技術開發與研究zh_TW
dc.titleDevelopment of InAlN/GaN Hemt for High Power and High Frequency Applicationsen_US
dc.typePlanen_US

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