實用銅膜之化學氣相沈積技術研究

dc.contributor.author	陳茂傑	en_US
dc.contributor.department	交通大學電子工程系	zh_TW
dc.date.accessioned	2014-12-13T10:37:58Z
dc.date.available	2014-12-13T10:37:58Z
dc.date.issued	2001	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.identifier.govdoc	NSC90-2215-E009-096	zh_TW
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=665788&docId=126395	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/94987
dc.language.iso	zh_TW	en_US
dc.subject	化學氣相沈積法	zh_TW
dc.subject	銅膜	zh_TW
dc.subject	積體電路製造	zh_TW
dc.subject	CVD	en_US
dc.subject	Copper film	en_US
dc.subject	Integrated circuit fabrication	en_US
dc.title	實用銅膜之化學氣相沈積技術研究	zh_TW
dc.title	Study and Development of Practical Copper Film Deposition by CVD Method	en_US
dc.type	Plan	en_US

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