Plasma-made silicon nanograss and related nanostructures

dc.citation.epageen_US
dc.citation.issue17en_US
dc.citation.volume44en_US
dc.citation.woscount14
dc.contributor.authorShieh, Jiannen_US
dc.contributor.authorRavipati, Srikanthen_US
dc.contributor.authorKo, Fu-Hsiangen_US
dc.contributor.authorOstrikov, Kostya (Ken)en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department材料科學與工程學系奈米科技碩博班zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentGraduate Program of Nanotechnology , Department of Materials Science and Engineeringen_US
dc.date.accessioned2014-12-08T15:11:34Z
dc.date.available2014-12-08T15:11:34Z
dc.date.issued2011-05-04en_US
dc.description.abstractPlasma-made nanostructures show outstanding potential for applications in nanotechnology. This paper provides a concise overview on the progress of plasma-based synthesis and applications of silicon nanograss and related nanostructures. The materials described here include black silicon, Si nanotips produced using a self-masking technique as well as self-organized silicon nanocones and nanograss. The distinctive features of the Si nanograss, two-tier hierarchical and tilted nanograss structures are discussed. Specific applications based on the unique features of the silicon nanograss are also presented.en_US
dc.identifier.doi10.1088/0022-3727/44/17/174010en_US
dc.identifier.issn0022-3727en_US
dc.identifier.journalJOURNAL OF PHYSICS D-APPLIED PHYSICSen_US
dc.identifier.urihttp://dx.doi.org/10.1088/0022-3727/44/17/174010en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/8882
dc.identifier.wosnumberWOS:000289512700010
dc.language.isoen_USen_US
dc.titlePlasma-made silicon nanograss and related nanostructuresen_US
dc.typeArticleen_US

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