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高性能多用途之新結構低溫複晶矽薄膜電晶體之製作

dc.contributor.author鄭晃忠en_US
dc.contributor.authorCHENG HUANG-CHUNGen_US
dc.contributor.department交通大學電子工程系zh_TW
dc.date.accessioned2014-12-13T10:32:14Z
dc.date.available2014-12-13T10:32:14Z
dc.date.issued2000en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC89-2215-E009-069zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=720352&docId=135312en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/91441
dc.language.isozh_TWen_US
dc.title高性能多用途之新結構低溫複晶矽薄膜電晶體之製作zh_TW
dc.titleHigh Performance and Versatile Low Temperature Polysilicon TFT Fabricated with New Structureen_US
dc.typePlanen_US

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