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等價位氮化物元件結構製備與相關物理特性研究(I)

dc.contributor.author陳衛國en_US
dc.contributor.authorWEI-KUOCHENen_US
dc.contributor.department國立交通大學電子物理學系zh_TW
dc.date.accessioned2014-12-13T10:35:45Z
dc.date.available2014-12-13T10:35:45Z
dc.date.issued2001en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC90-2112-M009-044zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=639691&docId=119715en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/93578
dc.language.isozh_TWen_US
dc.subject等價位氮化物zh_TW
dc.subject特性zh_TW
dc.subject元件zh_TW
dc.subjectIsoelectronic nitrideen_US
dc.subjectCharacterizationen_US
dc.subjectDeviceen_US
dc.title等價位氮化物元件結構製備與相關物理特性研究(I)zh_TW
dc.titleCharacterizations and Fabrications of Isoelectronic Doped Nitride Device Structures(I)en_US
dc.typePlanen_US

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