Film Profile Engineering (FPE): A New Concept for Manufacturing of Short-Channel Metal Oxide TFTs
| dc.citation.woscount | 0 | en_US |
| dc.contributor.author | Lyu, Rong-Jhe | en_US |
| dc.contributor.author | Lin, Horng-Chih | en_US |
| dc.contributor.author | Wu, Ming-Hung | en_US |
| dc.contributor.author | Shie, Bo-Shiuan | en_US |
| dc.contributor.author | Hung, Hsiang-Ting | en_US |
| dc.contributor.author | Huang, Tiao-Yuan | en_US |
| dc.contributor.department | 電機工程學系 | zh_TW |
| dc.contributor.department | Department of Electrical and Computer Engineering | en_US |
| dc.date.accessioned | 2015-07-21T08:31:07Z | |
| dc.date.available | 2015-07-21T08:31:07Z | |
| dc.date.issued | 2013-01-01 | en_US |
| dc.description.abstract | A film profile engineering (FPE) concept which utilizes the unique features of various deposition tools to tailor and optimize the profile of the deposited films was demonstrated with the fabricated ZnO TFTs. By implementing the PR trimming technique, high performance devices with L < 100 nm can be readily achieved. | en_US |
| dc.identifier.isbn | 978-1-4799-2306-9 | en_US |
| dc.identifier.issn | en_US | |
| dc.identifier.journal | 2013 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM) | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/124958 | |
| dc.identifier.wosnumber | WOS:000346509500070 | en_US |
| dc.language.iso | en_US | en_US |
| dc.title | Film Profile Engineering (FPE): A New Concept for Manufacturing of Short-Channel Metal Oxide TFTs | en_US |
| dc.type | Proceedings Paper | en_US |
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