Browsing by Author Chang, H. C.

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Showing results 1 to 8 of 8
Issue DateTitleAuthor(s)
2007A 45nm dual-port SRAM with write and read capability enhancement at low voltageWang, D. P.; Lia, H. J.; Yamauchi, H.; Chen, Y. H.; Lin, Y. L.; Lin, S. H.; Liu, D. C.; Chang, H. C.; Hwang, W.; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
20-Aug-2010Effects of sputtering pressure and Al buffer layer thickness on properties of AZO films grown by rf magnetron sputteringTseng, C. H.; Wang, W. H.; Chang, H. C.; Chou, C. P.; Hsu, C. Y.; 機械工程學系; Department of Mechanical Engineering
2014The Photocatalytic Activity and Compact Layer Characteristics of TiO2 Films Prepared Using Radio Frequency Magnetron SputteringChang, H. C.; Huang, H. H.; Wu, C. Y.; Hsu, R. Q.; Hsu, C. Y.; 機械工程學系; Department of Mechanical Engineering
10-Sep-2008Potential energy surfaces for the lowest excited states of the nitrogen-vacancy point defects in diamonds: A quantum chemical studyZyubin, A. S.; Mebel, A. M.; Chang, H. C.; Lin, S. H.; 應用化學系; 應用化學系分子科學碩博班; Department of Applied Chemistry; Institute of Molecular science
18-Jun-2009Quantum Chemical Modeling of Photoabsorption Properties of Two- and Three-Nitrogen Vacancy Point Defects in DiamondZyubin, A. S.; Mebel, A. M.; Hayashi, M.; Chang, H. C.; Lin, S. H.; 應用化學系; 應用化學系分子科學碩博班; Department of Applied Chemistry; Institute of Molecular science
15-Jan-2009Quantum Chemical Modeling of Photoadsorption Properties of the Nitrogen-Vacancy Pint Defect in DiamondZyubin, A. S.; Mebel, A. M.; Hayashi, M.; Chang, H. C.; Lin, S. H.; 應用化學系; 應用化學系分子科學碩博班; Department of Applied Chemistry; Institute of Molecular science
15-Jan-2009Quantum Chemical Modeling of Photoadsorption Properties of the Nitrogen-Vacancy Pint Defect in DiamondZyubin, A. S.; Mebel, A. M.; Hayashi, M.; Chang, H. C.; Lin, S. H.; 應用化學系; 應用化學系分子科學碩博班; Department of Applied Chemistry; Institute of Molecular science
1-Sep-2011Structural and optoelectronic properties of Al-doped zinc oxide films deposited on flexible substrates by radio frequency magnetron sputteringTseng, C. H.; Huang, C. H.; Chang, H. C.; Chen, D. Y.; Chou, C. P.; Hsu, C. Y.; 機械工程學系; Department of Mechanical Engineering