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Showing results 1 to 7 of 7
Issue DateTitleAuthor(s)
1-May-2004Alkylation of nanoporous silica thin films by high density plasma chemical vapor deposition of a-SIC : HPan, FM; Wu, BW; Cho, AT; Tsai, KC; Tsai, TG; Chao, KJ; Chen, JY; Chang, L; 材料科學與工程學系; Department of Materials Science and Engineering
2006Effect of trimethylsilylation on the film stress of mesoporous silica ultralow-k film stacksChen, JY; Pan, FM; Lin, DX; Cho, AT; Chao, KJ; Chang, L; 材料科學與工程學系; Department of Materials Science and Engineering
2005Emission of bright blue light from mesoporous silica with dense Si (Ge) nanocrystalsCho, AT; Shieh, JM; Shieh, J; Lai, YF; Dai, BT; Pan, FM; Kuo, HC; Lin, YC; Chao, KJ; Liu, PH; 材料科學與工程學系; 光電工程學系; Department of Materials Science and Engineering; Department of Photonics
1-Jun-2003Microstructure and mechanical properties of surfactant templated nanoporous silica thin films: Effect of methylsilylationChen, JY; Pan, FM; Cho, AT; Chao, KJ; Tsai, TG; Wu, BW; Yang, CM; Chang, L; 材料科學與工程學系; Department of Materials Science and Engineering
1-Jul-2005The preparation of mesoporous silica ultra-low-k film using ozone ashing treatmentCho, AT; Pan, FM; Chao, KJ; Liu, PH; Chen, JY; 材料科學與工程學系; Department of Materials Science and Engineering
2004Stable blue luminescence from mesoporous silica filmsShieh, JM; Cho, AT; Lai, YF; Dai, BT; Pan, FM; Chao, KJ; 材料科學與工程學系; 應用化學系; Department of Materials Science and Engineering; Department of Applied Chemistry
1-Sep-2005Thermal stability of trimethylsilylated mesoporous silica thin films as the ultralow-k dielectric for copper interconnectsChen, JY; Pan, FM; Chang, L; Cho, AT; Chao, KJ; 材料科學與工程學系; 應用化學系; Department of Materials Science and Engineering; Department of Applied Chemistry
Showing results 1 to 7 of 7