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Showing results 1 to 10 of 10
Issue DateTitleAuthor(s)
2003Anisotropic thermal conductivity of nano-porous silica filmTsui, BY; Yang, CC; Fang, KL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Jan-2004Anisotropic thermal conductivity of nanoporous silica filmTsui, BY; Yang, CC; Fang, KL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2002Electrical and material stability of Orion(TM) CVD ultra low-k dielectric film for copper interconnectionFang, KL; Tsui, BY; Yang, CC; Chen, MC; Lee, SD; Beekmann, K; Tony, W; Giles, K; Ishaq, S; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2000Electrical reliability issues of integrating low-K dielectrics with Cu metallizationWu, ZC; Shiung, ZW; Wang, CC; Fang, KL; Wu, RG; Liu, YL; Tsui, BY; Chen, MC; Chang, W; Chou, PF; Jang, SM; Yu, CH; Liang, MS; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2001Electrical reliability of low dielectric constant diffusion barrier (a-SiC : H) for copper interconnectFang, KL; Tsui, BY; Yang, CC; Lee, SD; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2005Electrical stability and reliability of ultralow dielectric constant porous carbon-doped oxide film for copper interconnectFang, KL; Tsui, BY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-May-2003Metal drift induced electrical instability of porous low dielectric constant filmFang, KL; Tsui, BY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Nov-2005A novel wafer reclaim method for amorphous SiC and carbon doped oxide filmsTsui, BY; Fang, KL; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2003A novel wafer reclaim method for silicon carbide filmTsui, BY; Fang, KL; Wu, CH; Li, YH; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Nov-2001Surface-processing-enhanced copper diffusion into fluorosilicate glassTsui, BY; Fang, KL; Lee, SD; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
Showing results 1 to 10 of 10