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顯示 1 到 2 筆資料，總共 2 筆
| 公開日期 | 標題 | 作者 |
| 1999 | Anti-reflection strategies for sub-0.18-mu m dual damascene structure patterning in KrF 248nm lithography | Chou, SY; Wang, CM; Hsia, CC; Chen, LJ; Hwang, GW; Lee, SD; Lou, JC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
| 1-一月-2007 | A thick CESL stressed ultra-small (Lg=40nm) SiGe-channel MOSFET fabricated with 193nm scanner lithography and TEOS hard mask etching | Liao, Wen-Shiang; Chen, Tung-Hung; Lin, Hsin-Hung; Chang, Wen-Tung; 材料科學與工程學系; Department of Materials Science and Engineering |
