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公開日期標題作者
11-二月-2016Gate-Stack Engineering for Self-Organized Ge-dot/SiO2/SiGe-Shell MOS CapacitorsLai, Wei-Ting; Yang, Kuo-Ching; Liao, Po-Hsiang; George, Tom; Li, Pei-Wen; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
4-十月-2019Ge nanodot-mediated densification and crystallization of low-pressure chemical vapor deposited Si3N4 for advanced complementary metal-oxide-semiconductor photonics and electronics applicationsPeng, Kang-Ping; Huang, Tsung Lin; George, Tom; Lin, Horng-Chih; Li, Pei-Wen; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
16-三月-2017High Photoresponsivity Ge-dot PhotoMOSFETs for Low-power Monolithically-Integrated Si Optical InterconnectsKuo, Ming-Hao; Lee, Meng-Chun; Lin, Horng-Chih; George, Tom; Li, Pei-Wen; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
5-八月-2019Tunable diameter and spacing of double Ge quantum dots using highly-controllable spacers and selective oxidation of SiGeHuang, Tsung-Lin; Peng, Kang-Ping; Chen, Ching-Lun; Lin, Horng-Chih; George, Tom; Li, Pei-Wen; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
16-十月-2017Very large photoresponsiviy and high photocurrent linearity for Ge-dot/SiO2/SiGe photoMOSFETs under gate modulationKuo, Ming-Hao; Hong, Po-Yu; Liu, Ping-Che; Lee, Meng-Chun; Lin, Horng-Chih; George, Tom; Li, Pei-Wen; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics