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201016奈米場效應電晶體特性擾動抑制暨TFT-LCD驅動電路設計優化之研究李國輔; Lee, Kuo-Fu; 李義明; Li, Yiming; 電信工程研究所
20103D Device Simulation of Work Function and Interface Trap Fluctuations on High-kappa/Metal Gate DevicesCheng, Hui-Wen; Li, Fu-Hai; Han, Ming-Hung; Yiu, Chun-Yen; Yu, Chia-Hui; Lee, Kuo-Fu; Li, Yiming; 傳播研究所; Institute of Communication Studies
1-四月-2010Asymmetric gate capacitance and dynamic characteristic fluctuations in 16 nm bulk MOSFETs due to random distribution of discrete dopantsLee, Kuo-Fu; Li, Yiming; Hwang, Chih-Hong; 電子工程學系及電子研究所; 電信工程研究所; Department of Electronics Engineering and Institute of Electronics; Institute of Communications Engineering
1-四月-2010Asymmetric gate capacitance and dynamic characteristic fluctuations in 16 nm bulk MOSFETs due to random distribution of discrete dopantsLee, Kuo-Fu; Li, Yiming; Hwang, Chih-Hong; 傳播研究所; 電機工程學系; Institute of Communication Studies; Department of Electrical and Computer Engineering
1-五月-2010Device and circuit level suppression techniques for random-dopant-induced static noise margin fluctuation in 16-nm-gate SRAM cellLee, Kuo-Fu; Li, Yiming; Li, Tien-Yen; Su, Zhong-Cheng; Hwang, Chin-Hong; 傳播研究所; 電機工程學系; Institute of Communication Studies; Department of Electrical and Computer Engineering
1-四月-2011Dual-Material Gate Approach to Suppression of Random-Dopant-Induced Characteristic Fluctuation in 16 nm Metal-Oxide-Semiconductor Field-Effect-Transistor DevicesLi, Yiming; Lee, Kuo-Fu; Yiu, Chun-Yen; Chiu, Yung-Yueh; Chang, Ru-Wei; 傳播研究所; 電機工程學系; Institute of Communication Studies; Department of Electrical and Computer Engineering
1-五月-2011Dynamic Characteristic Optimization of 14 a-Si:H TFTs Gate Driver Circuit Using Evolutionary Methodology for Display Panel ManufacturingLi, Yiming; Lee, Kuo-Fu; Lo, I-Hsiu; Chiang, Chien-Hshueh; Huang, Kuen-Yu; 傳播研究所; 電機工程學系; Institute of Communication Studies; Department of Electrical and Computer Engineering
1-一月-2010Hybrid Genetic Algorithm with Mixed Mutation Mechanism for Optimal Display Panel Circuit DesignLo, I-Hsiu; Li, Yiming; Lee, Kuo-Fu; 電信工程研究所; Institute of Communications Engineering
2009Statistical Analysis of Metal Gate Workfunction Variability, Process Variation, and Random Dopant Fluctuation in Nano-CMOS CircuitsHwang, Chih-Hong; Li, Tien-Yeh; Han, Ming-Hung; Lee, Kuo-Fu; Cheng, Hui-Wen; Li, Yiming; 傳播研究所; Institute of Communication Studies
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