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公開日期標題作者
1-一月-2003Effect of post-treatment on electrical properties of amorphous hydrogenated carbon films deposited by gridless ion beam depositionChen, CF; Li, YW; Huang, HL; 材料科學與工程學系; Department of Materials Science and Engineering
1-九月-2002Effects of ammonia plasma treatment on the electrical properties of plasma-enhanced chemical vapor deposition amorphous hydrogenated silicon carbide filmsLi, YW; Chen, CF; 材料科學與工程學系; Department of Materials Science and Engineering
1-八月-2004The effects of hydrogen plasma treatment on the plasma-enhanced chemical vapor deposition a-SiC : H filmsChen, CF; Li, YW; 材料科學與工程學系; Department of Materials Science and Engineering
1-二月-2001Electrical properties of diamond-like carbon films deposited using a filtered cathodic arc systemLi, YW; Chen, CF; Tseng, YJ; 材料科學與工程學系; Department of Materials Science and Engineering
1-十一月-2001Substrate bias effect on amorphous hydrogenated carbon films deposited by filtered cathodic arc depositionLi, YW; Chen, CF; Shue, YB; Yu, TC; Chang, JJK; 材料科學與工程學系; Department of Materials Science and Engineering
1-三月-2002Substrate bias effect on amorphous nitrogenated carbon films deposited by filtered arc depositionLi, YW; Shue, YB; Chen, CF; Yu, TC; Chang, JJK; 材料科學與工程學系; Department of Materials Science and Engineering
顯示 1 到 6 筆資料，總共 6 筆