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公開日期標題作者
2007Improving electrical characteristics of Ta/Ta2O5/Ta capacitors using low-temperature inductively coupled N2O plasma annealingTsai, Kou-Chiang; Wu, Wen-Fa; Chao, Chuen-Guang; Wu, Chi-Chang; 材料科學與工程學系; 材料科學與工程學系奈米科技碩博班; Department of Materials Science and Engineering; Graduate Program of Nanotechnology , Department of Materials Science and Engineering
1-六月-2006Improving electrical properties and thermal stability of (Ba,Sr)TiO3 thin films on Cu(Mg) bottom electrodesTsai, Kou-Chiang; Wu, Wen-Fa; Chao, Chuen-Guang; Lee, Jain-Tsai; Shen, Shih-Wen; 材料科學與工程學系; Department of Materials Science and Engineering
1-七月-2006Influence of bias-temperature stressing on the electrical characteristics of SiOC : H film with Cu/TaN/Ta-gated capacitorTsai, Kou-Chiang; Wu, Wen-Fa; Chao, Chuen-Guang; 材料科學與工程學系; Department of Materials Science and Engineering
15-七月-2007Influences of Ti, TiN, Ta and TaN layers on integration of low-k SiOC : H and CuTsai, Kou-Chiang; Wu, Wen-Fa; Chao, Chuen-Guang; Hsu, Jwo-Lun; Chiang, Chiu-Fen; 材料科學與工程學系; Department of Materials Science and Engineering
1-六月-2006Repairing of etching-induced damage of high-k Ba0.5Sr0.5TiO3 thin films by oxygen surface plasma treatmentTsai, Kou-Chiang; Wu, Wen-Fa; Chao, Chuen-Guang; Lee, Jain-Tsai; Hsu, Jwo-Lun; 材料科學與工程學系; Department of Materials Science and Engineering
顯示 1 到 5 筆資料，總共 5 筆