瀏覽 的方式: 作者 Wang, MY

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公開日期標題作者
1999Analysis on the key factors influencing competitive advantages of DRAM industry in TaiwanYuan, BJC; Wang, MY; 科技管理研究所; Institute of Management of Technology
2000Characterization and modeling of out-diffusion of cesium, manganese and zinc impurities from deep ultraviolet photoresistKo, FH; Wang, MY; Wang, TK; Yang, CC; Huang, TY; Wu, CS; 奈米中心; Nano Facility Center
1-九月-1999Characterization and modeling of out-diffusion of manganese and zinc impurities from deep ultraviolet photoresistWang, MY; Ko, FH; Wang, TK; Yang, CC; Huang, TY; 奈米中心; Nano Facility Center
1-五月-2001Characterization and modeling of the metal diffusion from deep ultraviolet photoresist and silicon-based substrateWang, TK; Wang, MY; Ko, FH; Tseng, CL; 奈米中心; Nano Facility Center
1-九月-1999Demand for business information service of firms in Taiwan: a case study of Hsinchu Science-based Industrial Park and Hsinchu Industrial ParkYuan, BJC; Wang, MY; Wang, CC; 科技管理研究所; Institute of Management of Technology
29-二月-2000Evaluation of cleaning efficiency with a radioactive tracer and development of a microwave digestion method for semiconductor processesLu, JK; Ko, FH; Chu, TC; Sun, YC; Wang, MY; Wang, TK; 奈米中心; Nano Facility Center
1999Evaluation of impurity migration and microwave digestion methods for lithographic materialsKo, FH; Hsiao, LT; Chou, CT; Wang, MY; Wang, TK; Sun, YC; Cheng, BJ; Yeng, S; Dai, BT; 奈米中心; Nano Facility Center
1-十二月-1999Evaluation of metal migration and determination of trace metals after microwave digestion for lithographic materialsKo, FH; Wang, MY; Wang, TK; 奈米中心; Nano Facility Center
1-十月-2000Migration-adsorption mechanism of metallic impurities out of chemically amplified photoresist onto silicon-based substratesYang, CC; Ko, FH; Wang, MY; Wang, TK; Wu, SC; 奈米中心; Nano Facility Center