瀏覽 的方式： 作者 Wang, Zheng-Ying
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| 公開日期 | 標題 | 作者 |
| 1-六月-2019 | Improvement of ferroelectric properties in undoped hafnium oxide thin films using thermal atomic layer deposition | Luo, Jun-Dao; Zhang, He-Xin; Wang, Zheng-Ying; Gu, Siang-Sheng; Yeh, Yun-Tien; Chung, Hao-Tung; Chuang, Kai-Chi; Liao, Chan-Yu; Li, Wei-Shuo; Li, Yi-Shao; Li, Kai-Shin; Lee, Min-Hung; Cheng, Huang-Chung; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics |
