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收集所有交通大學研究人員與學生個人或團體所發表之各項學術著作,涵蓋期刊論文、教師專書、學位論文等項。;;Collections of Publications of NCTU Researchers and Students Like Journal Papers and Thesis.

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Now showing 1 - 10 of 69
  • Item type:Item,
    Lasing in metal-coated GaN nano-stripe at room temperature
    (2011-01-01)
    Wang, Y. G.
    ;
    Chen, C. C.
    ;
    Chiu, C. H.
    ;
    Kuo, M. Y.
    ;
    Shih, M. H.
    We demonstrated lasing in a metal-coated GaN nano-stripe under room temperature pulsed operation, and the lasing mode at 370nm were observed. Aluminum and SiO2 layers were coated on the undoped GaN nano-stripe. (C) 2010 Optical Society of America
  • Item type:Item,
    Reduction of Efficiency Droop in Semipolar (1(1)over-bar01) InGaN/GaN Light Emitting Diodes Grown on Patterned Silicon Substrates
    (2011-01-01)
    Chiu, C. H.
    ;
    Lin, D. W.
    ;
    Lin, C. C.
    ;
    Li, Z. Y.
    ;
    Kuo, H. C.
    The semi-polar InGaN-based LEDs exhibits low efficiency droop because the reduction of the polarization field not only made the band diagram smoother but also restricted electron overflow to the p-GaN layer as shown in simulations. (C) 2010 Optical Society of America
  • Item type:Item,
    Enhanced Omnidirectional Photon Coupling via Quasi-Periodic Patterning of Indium-Tin-Oxide for Organic Thin-Film Solar Cells
    (2011-01-01)
    Tseng, P. C.
    ;
    Hsu, M. H.
    ;
    Chen, H. C.
    ;
    Tsai, M. A.
    ;
    Yu, Peichen
    Enhanced optical coupling with respect to all incident angles via an indium tin oxide quasi-periodic structure (ITO-QPS) for organic thin-film solar cells was demonstrated. The cell @2010 Optical Society of America
  • Item type:Item,
    Efficiency enhancement of UV/blue light emitting diodes via nanoscaled epitaxial lateral overgrowth of GaN on a SiO2 nanorod-array patterned sapphire substrate
    (2008-11-15)
    Chiu, C. H.
    ;
    Li, Zhen-Yu
    ;
    Chao, C. L.
    ;
    Lo, M. H.
    ;
    Kuo, H. C.
    High-quality GaN layer was successfully grown on a SiO2 nanorod-array patterned sapphire substrate (NAPSS) using metal-organic chemical vapor deposition by a nanoscaled epitaxial lateral overgrowth (NELO) method. From tunneling electron microscope images, well coalescence and turned dislocations are parallel to the surface direction were clearly observed. The Raman shift measurement shows the residual stress in GaN was greatly reduced from 1.359 to 0.652 GPa when compared to a GaN on flat sapphire substrate. Also, a high-efficiency GaN-based light-emitting diodes (LEDs) were demonstrated on the NELO NAPSS GaN, the respective output power and external quantum efficiency of the NELO NAPSS LEDs were estimated to be 22 mW and 40.2% at an injection current of 20 mA, showing an enhancement factor of 52% over conventional LEDs. The significant improvement resulted from both the enhanced light extraction assisted by the NAPSS, and the reduced dislocation densities using the NELO method. (c) 2008 Published by Elsevier B.V.
  • Item type:Item,
    Characteristics of a-plane GaN with the SiNx insertion layer grown by metal-organic chemical vapor deposition
    (2008-11-15)
    Ko, T. S.
    ;
    Wang, T. C.
    ;
    Huang, H. M.
    ;
    Chen, J. R.
    ;
    Chen, H. G.
    We utilized in-situ-grown SiNx insertion layers to mitigate part of dislocations stretching in nonpolar a-plane GaN films using metal-organic chemical vapor deposition. Both X-ray diffraction (XRD) and atomic force microscopy (AFM) measurements revealed that better crystal quality and smoother surface could be obtained when the in-situ SiNx layer was inserted closer to the r-plane sapphire substrate and indicated that the in-situ SiNx insertion layer could suppress dislocations caused by lattice mismatch between the sapphire and epitaxial layers. In addition, photoluminescence and cathodoluminescence measurements confirmed the effect of the in-situ SiNx insertion layer on the optical properties of the improved a-plane GaN thin film, which is consistent with the XRD and AFM analyses and suggested reduction in the density of nonradiative centers. (C) 2008 Elsevier B.V. All rights reserved.
  • Item type:Item,
    Optical characteristics of a-plane ZnO/Zn0.8Mg0.2O multiple quantum wells grown by pulsed laser deposition
    (2010-10-01)
    Ko, T. S.
    ;
    Lu, T. C.
    ;
    Zhuo, L. F.
    ;
    Wang, W. L.
    ;
    Liang, M. H.
    We reported optical properties of a-plane ZnO/ZnMgO multiple quantum wells (MQWs) structure grown by the pulse laser deposition system. The emission peak energy of a-plane ZnO/ZnMgO MQWs kept invariant in the power-dependent photoluminescence (PL) measurement, indicating the nonpolar characteristics due to the lack of built-in electric fields. Large exciton binding energy of 68 meV was deduced and no apparent S-curve appeared in temperature-dependent PL results, demonstrating less carrier localization effect in a-plane ZnO/ZnMgO MQWs. Large difference in electronic transition levels of 45 meV due to the valence band splitting was observed in the polarization dependent absorption spectrum. Furthermore, the high degree of polarization of 92% and 56% at 20 and 300 K in PL emission of a-plane ZnO/ZnMgO MQWs were obtained. (C) 2010 American Institute of Physics. [doi:10.1063/1.3488898]
  • Item type:Item,
    Efficiency Improvement of GaN-Based LEDs With a SiO2 Nanorod Array and a Patterned Sapphire Substrate
    (2010-06-01)
    Huang, H. W.
    ;
    Huang, J. K.
    ;
    Lin, C. H.
    ;
    Lee, K. Y.
    ;
    Hsu, H. W.
    The enhancement of light extraction from GaN-based light-emitting diodes (LEDs) with a patterned sapphire substrate (PSS) and a SiO2 12-fold photonic quasi-crystal (PQC) structure using nanoimprint lithography is presented. At a driving current of 20 mA on transistor-outline-can package, the light output powers of LED with a PSS and LED with a PSS and a SiO2 PQC structure are enhanced by 35% and 48%, compared with the conventional LED. In addition, the higher output power of the LED with a PSS and a SiO2 PQC structure is due to better reflectance on PSS and higher epitaxial quality on an n-GaN using a SiO2 12-fold PQC structure pattern. These results provide promising potential to increase output powers of commercial light-emitting devices.
  • Item type:Item,
    Light-Output-Power Enhancement of GaN-Based Light-Emitting Diodes on an n-GaN Layer Using a SiO2 Photonic Quasi-Crystal Overgrowth
    (2010-06-01)
    Huang, H. W.
    ;
    Huang, J. K.
    ;
    Lee, K. Y.
    ;
    Lin, C. F.
    ;
    Kuo, H. C.
    GaN-based LEDs with a SiO2 oxide PQC pattern on an n-GaN layer by nanoimprint lithography are fabricated and investigated. At a driving current of 20 mA on a Transistor-Outline-can package, the light output power of LED III (d = 1.2 mu m) was enhanced by a factor of 1.20. The internal-quantum-efficiency result offers promising potential to enhance the light output power of commercial light-emitting devices with a SiO2 oxide PQC structure on an n-GaN layer.
  • Item type:Item,
    Characteristics of emission polarization in a-plane nanorods embedded with InGaN/GaN multiple quantum wells
    (2010-09-15)
    Li, J. C.
    ;
    Lu, T. C.
    ;
    Huang, H. M.
    ;
    Chan, W. W.
    ;
    Kuo, H. C.
    Nonpolar (a-plane) GaN nanorod arrays with embedded In(x)Ga(1-x)N/GaN (x=0.09, 0.14, 0.24, and 0.30) multiple quantum wells (MQWs) grown on r-plane sapphire have been fabricated successfully by self-assembled Ni nanomasks and subsequent inductively coupled plasma reactive-ion etching. After nanorod fabrications, the polarization ratio of the emission from MQWs with lower indium composition (x=0.09 and 0.14) slightly decreases but apparently increases by at most 79% for the samples with higher indium composition (x=0.24 and 0.30). Competition between the effect of multiple scattering, strain relaxation and reduction in localized centers, expected in a-plane MQW samples, are attributed to the variations in the polarization ratios after the nanorod formation. (c) 2010 American Institute of Physics. [doi:10.1063/1.3483239]
  • Item type:Item,
    Improving Light Output Power of the GaN-Based Vertical-Injection Light-Emitting Diodes by Mg+ Implanted Current Blocking Layer
    (2009-05-01)
    Tsai, Min-An
    ;
    Yu, Peichen
    ;
    Chen, J. R.
    ;
    Huang, J. K.
    ;
    Chiu, C. H.
    A method for forming a current blocking layer (CBL) by ion implantation in GaN-based vertical-injection light-emitting diodes (VI-LEDs) was proposed. It was found that the use of CBL in VI-LEDs can effectively reduce the current crowding effect and enhance the light output power. The uniform emission intensity distribution of VI-LEDs with CBL was demonstrated by electroluminescence measurements. Experimental results show that the wall-plug efficiency was enhanced by 12.3% at an injection current of 20 mA, compared to that of VI-LEDs without CBL, and by 56.2% compared to that of conventional LEDs. The device simulation results reveal that the current path can be blocked by CBL, resulting in high light extraction efficiencies and large current densities within the effective emission region of active layers.