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收集所有交通大學研究人員與學生個人或團體所發表之各項學術著作,涵蓋期刊論文、教師專書、學位論文等項。;;Collections of Publications of NCTU Researchers and Students Like Journal Papers and Thesis.
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Item type:Item, Abnormal polarization switching phenomenon in a-plane AlxGa1-xN(2011-01-01) ;Huang, Huei-Min ;Huang, Hung-Hsun ;Wu, Yuh-Renn ;Lu, Tien-ChangKuo, Hao-ChungThe a-plane AlxGa1-xN layers show abnormal optical polarization switching behavior. This phenomenon can be well characterized by the assumption of the lambertian-like radiation pattern and simulated by utilizing the 6 x 6 k . p model. (C) 2010 Optical Society of AmericaItem type:Item, High Efficiency GaN-based Light Emitting Diodes with Embedded Air Voids/SiO2 Nanomasks(2012-01-01) ;Chiu, Ching-Hsueh ;Lin, Chien-Chung ;Han, Hau-Vei ;Lin, Da-WeiChen, Yan-HaoWe fabricated high efficiency LEDs with embedded micro-scale air voids and SiO2 nanomask exhibit smaller reverse-bias current and great enhancement of the light output (65% at 20mA) compared with the conventional LEDs.Item type:Item, Enhancing the Emission Efficiency of In0.2Ga0.8N/GaN MQW Blue LED by Using Appropriately Misoriented Sapphire Substrates(2009-01-01) ;Li, Zhen-Yu ;Uen, Wu-Yih ;Lo, Ming-Hua ;Chiu, Ching-HuaLin, Po-ChunIn this paper, we report the fabrication of an In0.2Ga0.8N/GaN multiple-quantum-well (MQW) structure on vicinal sapphire substrates with a very small offset angle of 0-1 degrees by low-pressure metallorganic chemical vapor deposition. Our study demonstrates that the quality of the In0.2Ga0.8N/GaN MQW structure is very sensitive to the offset angle of the vicinal substrate. High-resolution X-ray diffraction analyses demonstrated high-order satellite peaks and clear fringes between them for all MQW structures fabricated, from which the interface roughness (IRN) was estimated. The IRN of the In0.2Ga0.8N/GaN MQW structure fabricated on 0.2 degrees off sapphire substrate was determined as 1.36% of the quantum well layer period. Besides, reciprocal lattice mapping was employed to examine the strain status of the MQW. The lattice relaxation of the same specimen mentioned above was estimated to be 7.4x10(-5). It is therefore manifested that an In0.2Ga0.8N/GaN MQW structure with abrupt interfaces and good layer periodicity was grown. From it, a shortest radiative lifetime of 14.2 ns and a lowest fluctuation of 5.6 meV in the emission energy of micro-photoluminescence mapping were achieved. In addition, superior material qualities of the whole film fabricated on 0.2 degrees off substrate were recognized by cross-sectional transmission electron microscopy. Based on the results mentioned above, a high-quality In0.2Ga0.8N/GaN MQW blue light, emitting diode (LED) has been fabricated on 0.2 degrees off substrate, which demonstrated a strong room-temperature electroluminescence emission at the wavelength of 465 nm and with the full width at half maximum of only 19 nm. The same device also showed an output power of 13.4 mW and an external quantum efficiency of 19.2%. Both these characteristics are improved drastically compared with the devices fabricated on the substrates with other offset angles. Conclusively, the use of an appropriately misoriented sapphire substrate is suggested to be effective for elevating the emission efficiency of In0.2Ga0.8N/GaN MQW blue LED fabricated thereon.Item type:Item, High-Performance (AlxGa1-x)(0.5)In0.5P-Based Flip-Chip Light-Emitting Diode With a Geometric Sapphire Shaping Structure(2008-11-01) ;Lee, Yea-Chen ;Kuo, Hao-Chung ;Lee, Chia-En ;Lu, Tien-ChangWang, Shing-ChungAlGaInP-based flip-chip light-emitting diodes (LEDs) with geometric sapphire shaping structures were fabricated by sapphire chemical etching and glue-bonded techniques. Furthermore, a nanoscale rough texture was applied on the epiwafer surface. This novel structure improved the output light power, wall-plug efficiency, and reliability. The output power of this structure was enhanced 31.2% under 350-mA current injection as compared with the conventional AlGaInP flip-chip LEDs.Item type:Item, Fabrication and characteristics of a GaN-based microcavity laser with shallow etched mesa(2014-06-01) ;Lai, Ying-Yu ;Chou, Yu-Hsun ;Wu, Yu-Sheng ;Lan, Yu-PinLu, Tien-ChangIn this work, we have developed a simple GaN-based microcavity (MC) with an intracavity shallow etched mesa. The textured GaN-based MC incorporated two high-reflectivity dielectric Bragg mirrors and an InGaN/GaN multiple quantum well with a shallow etched mesa as an optical confined structure. Lasing and transverse optical confinement characteristics have been verified by measuring devices with different mesa diameters. A quality factor (Q) of 2600 and a threshold energy of 30 nJ have been observed in a 10-mu m-diameter device. Such a cavity structure could be implanted into electrically pumped GaN vertical-cavity surface-emitting lasers for supporting efficient transverse confinement. (C) 2014 The Japan Society of Applied PhysicsItem type:Item, Carrier localization degree of In0.2Ga0.8N/GaN multiple quantum wells grown on vicinal sapphire substrates(2009-01-01) ;Li, Zhen-Yu ;Lo, Ming-Hua ;Chiu, Ching-Hua ;Lin, Po-ChunLu, Tien-ChangIn this work, we have grown In0.2Ga0.8N/GaN multiple quantum well (MQWs) epitaxial structure on vicinal sapphire substrates by low pressure metal-organic chemical vapor deposition and investigated the relationship between carrier localization degree and vicinal angles of sapphire substrates. The optical analysis confirmed that the In0.2Ga0.8N/GaN MQWs grown on 0.2 degrees-off sapphire substrate exhibited the smallest carrier localization degree and more ordered In0.2Ga0.8N/GaN MQW structure. In addition, mechanisms for carrier localization in In0.2Ga0.8N/GaN MQWs grown on vicinal substrate were discussed based on the results obtained from the power and temperature dependent photoluminescence measurements. The Raman spectrum showing the in-plane compressive stress of the GaN epitaxial structures grown on vicinal sapphire substrates revealed the relation between the dislocation density and the carrier localization degree in MQWs. From transmission electron microscopy images, the threading dislocation density (TDD) of In0.2Ga0.8N/GaN MQWs grown on 0.2 vicinal sapphire substrate at the bottom of n-GaN layer was about 9.4 X 10(8) cm(-2) and reduced to 3.0 X 10(8) cm(-2) at the top of n-GaN layer. We also obtained the TDD of 5.6 X 10(7) cm(-2) in the MQW region and only 1.0 X 10(7) cm(-2) in the p-GaN region. Based on the results mentioned above, 0.2 degrees-off substrate can offer In0.2Ga0.8N/GaN MQW blue light-emitting diode structures with benefits, such as high crystal quality, low defects, and small carrier localization degree. (C) 2009 American Institute of Physics. (DOI: 10.1063/1.3055264)Item type:Item, Efficiency Improvement of Single-Junction In0.5Ga0.5P Solar Cell with Compositional Grading p-Emitter/Window Capping Configuration(2010-01-01) ;Chang, Yi-An ;Kuo, Hao-Chung ;Lu, Tien-Chang ;Lai, Fang-IKuo, Shou-YiIn this study a novel p-emitter/window capping configuration design applied to a p(+)-n In0.5Ga0.5P solar cell is developed. By grading the Ga and Al compositions in the interface between the p-In0.5Ga0.5P emitter and p-In0.5Al0.5P window layers, the output characteristics of the p(+)-n In0.5Ga0.5P solar cell are improved. It is found that the photoluminescence (PL) intensity is increased and the minority carrier lifetime obtained from room-temperature time-resolved (TR) PL measurement can be increased from 5.3 ns of the typical design to 7.0 ns, indicating that the application of compositional grading can improve crystal quality and the interface becomes smoother, thus reducing the nonradiative recombination losses. Both the short-circuit current and open-circuit voltage are increased correspondingly and the conversion efficiency is improved from 14.57% of the typical design to 15.32% of the new p-emitter/window configuration under one-sun air-mass 1.5 global illumination. (C) 2010 The Japan Society of Applied PhysicsItem type:Item, High efficiency GaN-based light-emitting diodes with embedded air voids/SiO2 nanomasks(2012-02-03) ;Chiu, Ching-Hsueh ;Lin, Chien-Chung ;Han, Hau-Vei ;Liu, Che-YuChen, Yan-HaoIn this paper, the high performance GaN-based light-emitting diodes (LEDs) with embedded microscale air voids and an SiO2 nanomask by metal-organic chemical vapor deposition (MOCVD) were demonstrated. Microscale air voids and an SiO2 nanomask were clearly observed at the interface between GaN nanorods (NRs) and the overgrown GaN layer by scanning electron microscopy (SEM). From the reflectance spectra we show strong reflectance differences due to the different refractive index gradient between the GaN grown on the nanotemplate and sapphire. It can increase the light extraction efficiency due to additional light scattering. The transmission electron microscopy (TEM) images show the threading dislocations were suppressed by nanoscale epitaxial lateral overgrowth (NELOG). The LEDs with embedded microscale air voids and an SiO2 nanomask exhibit smaller reverse-bias current and large enhancement of the light output (65% at 20 mA) compared with conventional LEDs.Item type:Item, A star-ring-bus architecture for WDM fiber-wireless system(2006-01-01) ;Chiou, Hung-Yu ;Peng, Peng-Chun ;Feng, Kai-Ming ;Peng, Wei-RenChen, JyeHongA self-healing star-ring-bus architecture for high-capacity WDM fiber-wireless system is proposed and verified experimentally. This architecture can provide reliable, flexible, and robust characteristics for large radio terminals. (C) 2006 Optical Society of America.Item type:Item, GaN-based vertical-cavity surface-emitting lasers operating at high temperature(2017-01-01) ;Chang, Tsu-Chi ;Kuo, Shiou-Yi ;Lian, Jhen-Ting ;Hong, Kuo-BinLu, Tien-ChangWe report on GaN-based vertical-cavity surface emitting lasers (VCSELs) capable of high temperature operation. The structures of VCSELs include double dielectric distributed Bragg reflectors and bonded to a silicon substrate with a p-side-down configuration, allowing a better heat dissipation. The temperature dependent lasing characteristics of VCSELs can sustain to 350K.