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Benchmarking of Monolayer and Bilayer Two-Dimensional Transition Metal Dichalcogenide (TMD) Based Logic Circuits and 6T SRAM Cells
(2016-01-01)
Yu, Chang-Hung
;
Su, Pin
;
Chuang, Ching-Te
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
We evaluate and benchmark the performance of logic circuits and stability/performance of 6T SRAM cells using monolayer and bilayer TMD devices based on ITRS 2028 (5.9nm) technology node. For the performance benchmarking of logic circuits, the tradeoff between electrostatic integrity ( monolayer favored) and carrier mobility (bilayer favored), and the issues regarding the uncertainties in the mobility ratio and source/drain series resistance, the underlap device design, and the off-current spec., etc. are comprehensively addressed. In the evaluation of SRAM cells, the cell immunity to random variations is focused. Besides, the impact of high R-SD of TMD materials on RSNM variability is also investigated. The source/drain underlap design is shown to alleviate the larger variability of bilayer SRAM cells. Finally, with superior electrostatics and immunity to random variations, the monolayer TMD devices are favored for low-power logic and SRAM applications; while the bilayer devices, with higher carrier mobility, are more suitable for high-performance logic and SRAM applications.
Evaluation of Monolithic 3-D Logic Circuits and 6T SRAMs With InGaAs-n/Ge-p Ultra-Thin-Body MOSFETs
(2016-03-01)
Yu, Kuan-Chin
;
Fan, Ming-Long
;
Su, Pin
;
Chuang, Ching-Te
;
電子工程學系及電子研究所
This paper evaluates monolithic 3-D logic circuits and 6T SRAMs composed of InGaAs-n/Ge-p ultra-thin-body MOSFETs while considering interlayer coupling through TCAD mixed-mode model. This paper indicates that monolithic 3-D InGaAs/Ge logic circuits provide equal leakage and better delay performance compared with planar 2-D structure through optimized 3-D layout. The monolithic 3-D InGaAs/Ge 6T SRAMs can simultaneously improve the cell stability and performance through optimized 3-D layout. We suggest two 3-D SRAM layout designs for high performance and low power applications, respectively. Moreover, with optimized 3-D layout designs, InGaAs/Ge logic circuits exhibit larger delay improvement, and the 6T SRAMs exhibit larger read access time and time-to-write improvement compared with Si counterparts.
Analysis of Single-Trap-Induced Random Telegraph Noise on FinFET Devices, 6T SRAM Cell, and Logic Circuits
(2012-08-01)
Fan, Ming-Long
;
Hu, Vita Pi-Ho
;
Chen, Yin-Nien
;
Su, Pin
;
Chuang, Ching-Te
This paper analyzes the impacts of single-charged-trap-induced random telegraph noise (RTN) on FinFET devices in tied- and independent-gate modes, 6T static random access memory (SRAM) cell stability, and several basic logic circuits. The dependence of RTN on trap location, EOT, and temperature is evaluated through 3-D atomistic TCAD simulation. It is observed that the charged trap located near the bottom of sidewall (gate) interface and in the middle region between the source and drain will result in the most significant impact. EOT scaling and higher operating temperature improve the immunity to RTN. RTN degradation in independent-gate mode and the dependence on the location of the trap and bias-dependent current-conduction path are analyzed. We show that the planar BULK device, with larger subthreshold swing (S.S.) and comparable trap-induced V-T shift, exhibits less nominal RTN degradation than FinFET for traps placed in the worst position. However, the larger variability and surface conduction characteristic of the planar BULK device lead to broader dispersion and larger worst case RTN degradation than the FinFET device with smaller variability and volume conduction. For traps randomly placed across the interface, similar RTN amplitude dispersions are observed for FinFET and planar BULK devices except in the vicinity of distribution tail due to the strong interaction between the charged trap and discrete random dopants in planar BULK devices. For 6T FinFET SRAM cell, the READ static noise margin of 64 possible combinations from trapping/detrapping in each cell transistor is examined. Because of reduced carriers with decreasing supply voltage (V-dd), the importance of RTN on subthreshold cell stability increases. Moreover, the leakage and delay of FinFET inverters, two-way NAND, and two-to-one multiplexer are investigated using 3-D TCAD mixed-mode simulations. The RTN is found to cause similar to 24%-27% and similar to 13%-15% variations in leakage and delay at V-dd = 0.4 V, respectively, for the logic circuits evaluated.
Performance and Stability Benchmarking of Monolithic 3-D Logic Circuits and SRAM Cells With Monolayer and Few-Layer Transition Metal Dichalcogenide MOSFETs
(2017-05-01)
Yu, Chang-Hung
;
Su, Pin
;
Chuang, Ching-Te
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
For the first time, considering the architecture of monolithic 3-D integration, we evaluate and benchmark the performance of 3-D logic circuits and stability/performance of 3-D 6T SRAM cells with monolayer and few-layer transition metal dichalcogenide (TMD) devices based on ITRS 2028 (5.9 nm) technology node. The impact of random variations on the cell stability is also investigated. With the possibility of adopting monolayer or fewlayer TMDs for nFET- and pFET-tiers enabled by monolithic 3-D integration, this paper indicates that the trilayer TMD device may substantially degrade the performance of 3-D logic circuits in spite of its higher mobility. This paper also reveals that stacking the monolayer pFET-tier over the bilayer nFET-tier may provide better nominal stability and read/write performance for 6T superthreshold SRAM compared with the planar technology, whereas the optimum 3-D configuration for near-/sub-threshold operations appears to be the monolayer pFET-tier over the monolayer nFET-tier. Besides the 6T cell structure, 8T SRAM cells are also investigated with monolithic 3-D integration for near-threshold/subthreshold operation. Themonolayer nFET-tier over the bilayer pFET-tier configuration is shown to be the optimum 3-D 8T near-threshold/subthreshold cell design.

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