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Item type:Item, Microstructures and electrical properties of V2O5-based multicomponent ZnO varistors prepared by microwave sintering process(1997-03-01) ;Chen, CS ;Kuo, CT ;Wu, TB ;Lin, IN材料科學與工程學系The V2O5-based ZnO varistor materials were successfully densified using microwave sintering process. The materials can reach a high density as 94.6% T.D. (theoretical density) when sintered at 800 degrees C (10 min) but the grain growth was initiated only when sintered at a higher temperature than 1000 degrees C (10 min). The varistor characteristics, including breakdown voltage (V-bk), nonlinear coefficient (alpha) and leakage current density (J(L)), degraded markedly for the samples sintered at too high temperature (i.e., T greater than or equal to 1000 degrees C) and for too long period (i.e., t greater than or equal to 10 min) that was ascribed to the occurrence of abnormal grain growth. Contrarily, the intrinsic characteristics, including potential barrier height (phi(b)) and donor density (N-d), varied only moderately with these sintering conditions. The V2O5-based ZnO materials sintered at 1000 degrees C (5 min) possessed good varistor characteristics as V-bk = 248 V/mm, alpha = 31 and J(L) = 4.6 x 10(-5) A/cm(2). The corresponding intrinsic parameters are phi(b) = 0.63 eV and N-d = 2.37 x 10(24) m(-3).Item type:Item, The 3rd Asian Conference on Chemical Vapor Deposition (3rd Asian-CVD), Taipei, Taiwan, November 12-14, 2004 - Preface(2006-02-24) ;Feng, ZC ;Chen, CF ;Kuo, CT ;Williams, KShan, WItem type:Item, Microstructure and nonlinear properties of microwave-sintered ZnO-V2O5 varistors: I, effect of V2O5 doping(1998-11-01) ;Kuo, CT ;Chen, CS ;Lin, IN ;材料科學與工程學系Department of Materials Science and EngineeringThe modification of the densification behavior and the grain-growth characteristics of the microwave-sintered ZnO materials, caused by the incorporation of V2O5 additives, have been systematically studied. Generally, the addition of V2O5 markedly enhances the densification rate, such that a density as high as 97.9% of the theoretical density and a grain size as large as 10 mu m can be attained for a sintering temperature as low as 800 degrees C and a soaking time as short as 10 min. Increasing the sintering temperature or soaking time does not significantly change the sintered density of the ZnO-V2O5 materials but it does monotonously increase their grain size. Varying the proportion of V2O5 in the range of 0.2-1.0 mol% does not pronouncedly modify such behavior. The leakage current density (J(L)) of these high-density and uniform-granular-structure samples is still large, which is amended by the incorporation of 0.3 mol% of Mn3O4 in the ZnO materials, in addition to 0.5 mol% of the V2O5 additives. Samples that are obtained using such a method possess good nonohmic characteristics (alpha = 23.5) and a low leakage current density (J(L) = 2.4 x 10(-6) A/cm(2)).Item type:Item, Microstructure and nonlinear properties of microwave-sintered ZnO-V2O5 varistors: II, effect of Mn3O4 doping(1998-11-01) ;Kuo, CT ;Chen, CS ;Lin, IN ;材料科學與工程學系Department of Materials Science and EngineeringThe microstructure and nonlinear current-voltage characteristics of Mn3O4-doped ZnO-V2O5 ceramics, microwave-sintered at 800 degrees-1200 degrees C for 10 min, have been investigated. A high density (96% of the theoretical density) has been achieved. The incorporation of Mn3O4 additives does not significantly alter the densification behavior of the ZnO-V2O5 materials, but rather pronouncedly increases the non-linear coefficient (alpha = 23.5) and markedly suppresses their leakage current density (J(L) = 2.4 x 10(-6) A/cm(2)). On the other hand, the intrinsic properties of the materials, including the Schottky barrier height (Phi(b)) and the donor density (N-d), are only moderately modified; that is, Phi(b) = 1.16 eV and N-d = 5.4 x 10(17)/cm(3). X-ray diffractometry analyses and energy-dispersive X-ray microanalyses (via scanning electron microscopy) indicate that the V2O5 species facilitate the densification and the development of microstructure via the formation of a liquid phase (Zn-3(VO4)(2)) along the grain boundaries, whereas the Mn3O4 species markedly enhance the nonohmic behavior of the ZnO-V2O5 materials by forming the surface states along the grain boundaries.Item type:Item, The use of a biomolecular target for crystalline carbon nitride film deposition by Ar ion-beam sputtering without any other source of nitrogen(1998-06-29) ;Chen, LC ;Lu, TR ;Kuo, CT ;Bhusari, DMWu, JJCarbon nitride films have been synthesized by argon ion-beam sputtering from a biomolecular compound target, 8-aza-6-aminopurine (C4N6H4) The compound has a six-membered ring structure similar to that existing in the hypothetical beta-C3N4. Except fur the target material, no other source of nitrogen was used during sputtering deposition. It was found that crystalline carbon nitride with high N/C atomic composition ratios of 0.43-0.56 can be formed even at room temperature. The infrared spectra of the film exhibit two peaks at 1383 and 1643 cm(-1), corresponding to C-N and C=N stretching modes, respectively. No detectable peak at 2200 cm(-1) (C=N stretching mode) is observed. Both x-ray diffraction and transmission electron microscopy show a very strong broad peak at 3.2 Angstrom, comparable to the d spacing of the (110) orientation in the beta-C3N4 structure. However, it is suggested that the film contains a nanocrystalline phase with a crystal structure yet to be determined. (C) 1998 American Institute of Physics.Item type:Item, Fabrication and field emission characteristics of highly ordered titanium oxide nanodot arrays(2005) ;Chen, PL ;Huang, WJ ;Chang, JK ;Kuo, CTPan, FMA field emission triode device has been fabricated using self-organized nanodot arrays as the electron emission source. Uniform nanodot arrays of titanium oxide were prepared from the Al/Ti film stack on silicon substrates by electrochemical anodization. The field emission triodes with titanium oxide nanodot emitters exhibited a low gate turn-on voltage of 45 V and high emission current density of 25 mA/cm(2) at 120 V. The excellent electric properties and easily controllable fabrication process of the nanodot triodes show potential applications for field emission displays and vacuum microelectronics. (c) 2005 The Electrochemical Society.Item type:Item, Brazing characteristics of diamond on various substrates with different brazing alloys(1995) ;Kuo, CT ;Lin, CR ;Lien, HM ;材料科學與工程學系Department of Materials Science and Engineering