<link rel="stylesheet" href="styles.cf390c6bfbe7555f.css">

學術出版;;Publications

Permanent URI for this communityhdl:11536/1

收集所有交通大學研究人員與學生個人或團體所發表之各項學術著作，涵蓋期刊論文、教師專書、學位論文等項。;;Collections of Publications of NCTU Researchers and Students Like Journal Papers and Thesis.

Browse

Filters

2009 - 200912010 - 20172

Settings

🏛️國立陽明交通大學機構典藏

Author: search.filters.author.Lee, Hsin-YiSubject: search.filters.subject.Atomic layer deposition

Search Results

Now showing 1 - 3 of 3
  • Thumbnail Image
    Item type:Item,
    High mobility transparent conductive Al-doped ZnO thin films by atomic layer deposition
    (2017-12-15)
    Lin, Man-Ling
    ;
    Huang, Jheng-Ming
    ;
    Ku, Ching-Shun
    ;
    Lin, Chih-Ming
    ;
    Lee, Hsin-Yi
    The effects of growth temperature on the microstructure, transport and optoelectronic properties of a series of Al-doped ZnO (AZO) films with thickness of similar to 30 nm deposited on polished silicon-(100) and glass substrates by the atomic layer deposition (ALD) were investigated. By adopting an in-situ doping growth scheme the critical length effect associated with adjacent Al2O3 layers commonly encountered in previous ALD growth schemes was avoided and effective Al-doping was achieved with the growth temperature ranging from 100 degrees C to 300 degrees C. Experimental results showed that, in general, increasing the growth temperature would result in much improved film crystallinity and carrier mobility, with the average transmittance in the visible wavelength range being exceeding 95% in all cases. In particular, for AZO films grown at 300 degrees C, an unprecedented mobility of 136 cm(2)V(-1)s(-1) was obtained, comparing to the typical values of 50-60 cm(2)V(-1)s(-1) reported previously. The resistivity of these 300 degrees C films (rho approximate to 6 x 10(-4) Omega-cm), nevertheless, is slightly higher than that of some highly-doped ZnO (rho approximate to 2 -4 x 10(-4) Omega-cm) prepared by sputtering methods. The secondary ion mass spectroscopy (SIMS) analyses revealed that hydrogen incorporation is the key in reducing the charge trap density and, hence, resulting in much enhanced carrier mobility. The present results promise a keen competitiveness of AZO with the indium tin oxide (ITO) film for thin-film-transistor (TFT) as well as in photovoltaic device applications. (C) 2017 Elsevier B.V. All rights reserved.
  • Thumbnail Image
    Item type:Item,
    Fabrication of epitaxial ZnO films by atomic-layer deposition with interrupted flow
    (2009-12-31)
    Ku, Ching-Shun
    ;
    Huang, Jheng-Ming
    ;
    Lin, Chih-Ming
    ;
    Lee, Hsin-Yi
    ;
    材料科學與工程學系
    We formed epitaxial ZnO thin films on a (0001) c-plane sapphire substrate through deposition of atomic layers (ALD) at 25-160 degrees C using diethylzinc (DEZn) and deionized water as precursors in combination with interrupted flow. High-resolution X-ray diffraction measurements were employed to characterize the microstructure of these films. With interrupted flow, we obtained ZnO thin films with an optimal growth window in a range of 40-160 degrees C, effectively decreasing the growth temperature by about 120 degrees C relative to a conventional method involving continuous flow. X-ray reflectivity measurements showed that the rate of growth increased also between 20 degrees C and 120 degrees C. The XRD results indicate that the stock time might extend the reaction of DEZn and water through an increased duration. All results show that a low temperature for growth improves the crystalline quality and is consistent with thermodynamically blocked self-compensation. (C) 2009 Elsevier B.V. All rights reserved.
  • Thumbnail Image
    Item type:Item,
    Epitaxial growth of ZnO films at extremely low temperature by atomic layer deposition with interrupted flow
    (2010-04-15)
    Ku, Ching-Shun
    ;
    Lee, Hsin-Yi
    ;
    Huang, Jheng-Ming
    ;
    Lin, Chih-Ming
    ;
    材料科學與工程學系
    Thin crystalline films of zinc oxide (ZnO) of high quality have been grown epitaxially on a (0 0 0 1) c-plane of a sapphire substrate with atomic layer deposition (ALD) at extra-low temperature. With diethylzinc (DEZn) and deionized water as precursors in combination with interrupted flow, we obtained ZnO thin films with an optimal growth window in a range 25-160 degrees C, so effectively lowering the growth temperature by about 120 degrees C relative to the conventional method involving a continuous-flow. We characterized the microstructure of these films with X-ray reflectivity and high-resolution X-ray diffraction (XRD) measurements. The XRD results indicate that the stock time might extend the reaction of DEZn and water through an increased duration. This low temperature for growth results in increased crystalline quality and reduced the non-radiative recombination process to enhance the optical properties of ZnO films. (c) 2009 Elsevier B.V. All rights reserved.