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Now showing 1 - 7 of 7

Broadband Omnidirectional Light Trapping in Gold-Decorated ZnO Nanopillar Arrays
(2017-04-05)
Chang, Yuan-Ming
;
Lin, Man-Ling
;
Lai, Tung-Yen
;
Chen, Chang-Hung
;
Lee, Hsin-Yi
The photoluminescence (PL) and reflectivity characteristics of zinc oxide nanopillars- (ZnO-NPs) grown on indium tin oxide (ITO)-coated glasses were investigated. The room temperature PL showed bright -white -light emission for the undoped ZnO-NPs grown at 600 degrees C, suggesting the close relation between the optical characteristic and "the growth conditions being, carried out for,obtaining the present ZnO-NPs. The reflectivity of the as -grown ZnO-NPs array was about, similar to 29% with the wavelength of the incident light ranging from 200 to 1800 nm. Nevertheless, the reflectance reduced significantly to less than 9.9% when a layer of gold (Au) was deposited on ZnO=NPg by sputtering for 5 min, corresponding to more than 65% reduction in Au -coated ZnQ-NPs (Au/ZnO-NPs). Moreover, the angle -resolved reflectance measurement's on the present Au/ZnO-NPs array show an omnidirectional light -trapping characteristic. These remarkable characteristics, broadband and omnidirectional light -trapping -of Ati/ZnO-NPs, are attributed to the extended effective optical path of the incident light due to subwavelength scattering resulting,from the presence of Au nanoparticics.
Optoelectronic properties in vertically aligned ZnO/Si-nanopillars
(2012)
Lee, Hsin-Yi
;
Chang, Yuan-Ming
;
Tseng, Wen-Shou
;
Kao, Pin-Hsu
;
Wang, Hau-Wei
An effective method of fabricating vertically aligned silicon nanopillars (Si-NPs) was realized by using the self-assembled silver nanodots as natural metal-nanomask for subsequent etching process. Ultrathin (similar to 9 nm) ZnO films were deposited on the Si-NPs by atomic layer deposition to enhance the field emission property. The turn-on field defined by the 10 mu A/cm(2) current density criterion is similar to 0.74 V/mu m with an estimated beta similar to 1.33X10(4). The low turn-on field and marked enhancement in beta were attributed to the small radius of curvature, high aspect ratio, and perhaps more importantly, proper density distribution of the ZnO/Si-NPs. On the other hand, room-temperature ultraviolet (UV) luminescence was investigated for the atomic layer deposited ZnO films grown on Si nanowires fabricated by self-masking dry etching in hydrogen-containing plasma. For films deposited at 200 degrees C, an intensive UV emission corresponding to free-exciton recombination was observed with a nearly complete suppression of the defect-associated broad visible range emission peak.
Fabrication of epitaxial ZnO films by atomic-layer deposition with interrupted flow
(2009-12-31)
Ku, Ching-Shun
;
Huang, Jheng-Ming
;
Lin, Chih-Ming
;
Lee, Hsin-Yi
;
材料科學與工程學系
We formed epitaxial ZnO thin films on a (0001) c-plane sapphire substrate through deposition of atomic layers (ALD) at 25-160 degrees C using diethylzinc (DEZn) and deionized water as precursors in combination with interrupted flow. High-resolution X-ray diffraction measurements were employed to characterize the microstructure of these films. With interrupted flow, we obtained ZnO thin films with an optimal growth window in a range of 40-160 degrees C, effectively decreasing the growth temperature by about 120 degrees C relative to a conventional method involving continuous flow. X-ray reflectivity measurements showed that the rate of growth increased also between 20 degrees C and 120 degrees C. The XRD results indicate that the stock time might extend the reaction of DEZn and water through an increased duration. All results show that a low temperature for growth improves the crystalline quality and is consistent with thermodynamically blocked self-compensation. (C) 2009 Elsevier B.V. All rights reserved.
Growth of high-quality epitaxial ZnO films on (10-10) sapphire by atomic layer deposition with flow-rate interruption method
(2013-09-01)
Huang, Jheng-Ming
;
Ku, Ching-Shun
;
Lee, Hsin-Yi
;
Lin, Chih-Ming
;
Chen, San-Yuan
A novel process in an atomic layer deposition system with "flow-rate interruption" (FRI) was developed to obtain epitaxial ZnO films of high quality. The m-plane ZnO thin films were grown on m-plane sapphire substrates by atomic layer deposition with FRI or a conventional continuous-flow method at the temperature in the range of 25-260 degrees C; 200 degrees C appeared optimal. Measurements of X-ray reflectivity indicated that the thickness of ZnO films with FRI is almost twice than that grown with the continuous-flow method. The structural, optical and electrical properties were investigated with X-ray diffraction (XRD), photoluminescence and Hall measurements. The diffraction results indicated that the interrupted flow might extend the reaction of diethylzinc and water through an increased duration to improve the crystallographic quality of the films. According to the results from XRD at high resolution, to substantiate the epitaxial relation between the thin film and the substrate, an off-normal azimuthal scan along ZnO (201) demonstrated two-fold symmetry that indicated the ZnO films to be in epitaxial growth on sapphire. The photoluminescence results showed a strongly enhanced near-band-edge emission of an FRI sample, and the donor-bond exciton appearing in films also indicated superior crystalline qualities. The Hall mobility of the FRI method was up to 64.7 cm(2) V-1 s(-1). The FRI method evidently improved the structural, optical and electrical properties of the ZnO films with small consumption of precursors. (C) 2012 Elsevier B.V. All rights reserved.
Field Emission in Vertically Aligned ZnO/Si-Nanopillars with Ultra Low Turn-On Field
(2012-03-01)
Chang, Yuan-Ming
;
Liu, Mao-Chen
;
Kao, Pin-Hsu
;
Lin, Chih-Ming
;
Lee, Hsin-Yi
An effective method of fabricating vertically aligned silicon nanopillars (Si-NPs) was realized by using the self-assembled silver (Ag) nanodots as natural metal-nanomask during dry etching process. The obtained Si-NPs were preferentially aligned along the c-axis direction. Ultrathin ZnO films (similar to 9 nm) were subsequently deposited on the Si-NPs by atomic layer deposition (ALD) to enhance the field emission property. The average diameter of the ZnO/Si-NPs is in the order of tens of nanometers, which enables efficient field emission and gives rise to marked improvement in the field enhancement factor, beta. The turn-on field defined by the 10 mu A/cm(2) current density criterion is similar to 0.74 V/mu m with an estimated beta approximate to 1.33x10(4). The low turn-on field and marked enhancement in beta were attributed to the small radius of curvature, high aspect ratio, and perhaps more importantly, proper density distribution of the ZnO/Si-NPs.
Enhanced Free Exciton and Direct Band-Edge Emissions at Room Temperature in Ultrathin ZnO Films Grown on Si Nanopillars by Atomic Layer Deposition
(2011-11-01)
Chang, Yuan-Ming
;
Shieh, Jiann
;
Chu, Pei-Yuan
;
Lee, Hsin-Yi
;
Lin, Chih-Ming
Room-temperature ultraviolet (UV) luminescence was investigated for the atomic layer deposited ZnO films grown on silicon nanopillars (Si-NPs) fabricated by self-masking dry etching in hydrogen-containing plasma. For films deposited at 200 degrees C, an intensive UV emission corresponding to free-exciton recombination (similar to 3.31 eV) was observed with a nearly complete suppression of the defect-associated broad visible range emission peak. On the other hand, for ZnO films grown at 25 degrees C, albeit the appearance of the defect-associated visible emission, the UV emission peak was observed to shift by similar to 60 meV to near the direct band edge (3.37 eV) recombination emission. The high-resolution transmission electron microscopy (HRTEM) showed that the ZnO films obtained at 25 degrees C were consisting of ZnO nanocrystals with a mean radius of 2 nm embedded in a largely amorphous matrix. Because the Bohr radius of free-exictons in bulk ZnO is similar to 2.3 nm, the size confinement effect may have occurred and resulted in the observed direct band edge electron-hole recombination. Additionally, the results also demonstrate order of magnitude enhancement in emission efficiency for the ZnO/Si-NP structure, as compared to that of ZnO directly deposited on Si substrate under the same conditions.
Epitaxial growth of ZnO films at extremely low temperature by atomic layer deposition with interrupted flow
(2010-04-15)
Ku, Ching-Shun
;
Lee, Hsin-Yi
;
Huang, Jheng-Ming
;
Lin, Chih-Ming
;
材料科學與工程學系
Thin crystalline films of zinc oxide (ZnO) of high quality have been grown epitaxially on a (0 0 0 1) c-plane of a sapphire substrate with atomic layer deposition (ALD) at extra-low temperature. With diethylzinc (DEZn) and deionized water as precursors in combination with interrupted flow, we obtained ZnO thin films with an optimal growth window in a range 25-160 degrees C, so effectively lowering the growth temperature by about 120 degrees C relative to the conventional method involving a continuous-flow. We characterized the microstructure of these films with X-ray reflectivity and high-resolution X-ray diffraction (XRD) measurements. The XRD results indicate that the stock time might extend the reaction of DEZn and water through an increased duration. This low temperature for growth results in increased crystalline quality and reduced the non-radiative recombination process to enhance the optical properties of ZnO films. (c) 2009 Elsevier B.V. All rights reserved.

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