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Resistive switching properties of SrZrO(3)-based memory films
(2007-04-01)
Lin, Chun-Chieh
;
Lin, Chao-Cheng
;
Tu, Bing-Chung
;
Yu, Jung-Sheng
;
Lin, Chen-Hsi
The resistive switching properties of the sputter-deposited SrZrO(3) (SZO) memory films were investigated in this study. The resistive switching behaviors of the SZO film can be improved by doping with vanadium oxide. The conduction mechanisms of the high and low current states of the 0.3% V-doped SZO (V:SZO) film are ohmic conduction and Frenkel-Poole emission, respectively, which implies the bulk effect of the memory film. The resistive ratio of two current states of the 0.3% V:SZO film remains 1000 times after applying 100 voltage sweeping cycles. Furthermore, the 0.3% V:SZO film shows stable resistive switching properties when measurement is performed at 100 degrees C. The band modulation of the SZO/LNO interface is proposed to explain the forming process of the SZO films. The 0.3% V:SZO memory film has excellent properties, such as high stability, good endurance, and long retention time, which make it a good candidate for next-generation nonvolatile memory application.
Memory effect of RF sputtered ZrO2 thin films
(2007-12-03)
Lin, Chih-Yang
;
Wu, Chung-Yi
;
Wu, Chen-Yu
;
Lin, Chun-Chieh
;
Tseng, Tseung-Yuen
Electrical properties of RF sputtered ZrO2 Memory thin films were investigated in this study. The device with structure AI/ZrO2/Pt shows a reproducible resistive switching behavior traced over 100 times at room temperature. Moreover, by using various top electrodes, such as Pt, Cu, Ni, Ag, Ti, and even W-probe, the resistive switching phenomenon can be observed in ZrO2-based memory with Pt bottom electrode, indicating that the ZrO2 bulk dominates the resistive switching. The bias polarity dependent resistive switching behavior is demonstrated in the Ti/ZrO2/Pt device, which might be due to interface reaction between Ti and ZrO2 film. The resistance value of high conductive state in the Ti/ZrO2/Pt device decreases with increasing current compliance implying the possibility for multi-bit storage. Besides, the Ti/ZrO2/Pt device can be operated over 2000 resistive switching cycles at 85 degrees C by sweeping DC voltage, and the two memory states demonstrate good stability under read voltage stress at room temperature and 95 degrees C. The write-read-erase-read operations can be over 10(3) cycles at 85 degrees C. No data loss is found upon successive readout before and after performing 10(3) endurance cycles at 85 degrees C. According to above experimental results, the ZrO2 thin film has high potential for nonvolatile memory application. (C) 2007 Elsevier B.V. All rights reserved.
Stable resistive switching behaviors of sputter deposited V-doped SrZrO3 thin films
(2007-12-03)
Lin, Chun-Chieh
;
Yu, Jung-Sheng
;
Lin, Chih-Yang
;
Lin, Chen-Hsi
;
Tseng, Tseung-Yuen
The influences of doping concentration and element on the resistive switching properties of SZO-based memory devices are investigated in this study. The sputter-deposited LNO bottom electrode and SZO resistive layer exhibit (100)-preferred orientation, and the LNO film annealed at 600 degrees C performs smooth surface and high conductivity. The 0.3% V:SZO memory device depicts the good switching behaviors including high resistance ratio, high endurance, long retention time, and non-destructive readout property. The turn-on voltage is slightly dependent on the SZO thickness, while the turn-off voltage is almost irrelative to the thickness. Besides, the switching properties of MoO3-, MoO2-, and Cr2O3-doped SZO devices are also studied. The results demonstrate that the resistive switching is an intrinsic property of the SZO film, but proper doping concentration and element can improve and stabilize the resistive switching behaviors. (C) 2007 Elsevier B.V. All rights reserved.
Resistive switching properties of sol-gel derived Mo-doped SrZrO3 thin films
(2007-12-15)
Lin, Chih-Yang
;
Lin, Chun-Chieh
;
Huang, Chun-Hsing
;
Lin, Chen-Hsi
;
Tseng, Tseung-Yuen
Hysteretic I-V characteristics of the SrZrO3 (SZO) thin films with various Mo-doping concentrations were investigated in the study. The 0.2 mol% Mo-doping SZO-based memory device showed excellent resistive switching characteristics, and the resistive switching can be operated over 300 times during successive operation. Both high and low conductive states were stable over 10(4) s. Multi-bit behavior was investigated by dc voltage sweeping with different spans of voltage scan for OFF-process and by various OFF-pulse voltages as well. The endurance test can be over 1000 times with no data loss found. The experimental results showed high potential for nonvolatile memory application. (c) 2007 Published by Elsevier B.V.
Effect of Top Electrode Materials on the Nonvolatile Resistive Switching Characteristics of CCTO Films
(2011-03-01)
Lin, Chun-Chieh
;
Chang, Yi-Peng
;
Ho, Chia-Cheng
;
Shen, Yu-Shu
;
Chiou, Bi-Shiou
A novel material CaCu(3)Ti(4)O(12) (CCTO) for resistive random access memory (RRAM) application was prepared by sol-gel spin-coating method. Our previous studies indicated that the CCTO possesses stable resistive switching behavior. In this work, the effects of the top electrode (TE) material on the resistive switching characteristics of CCTO films are investigated. It indicates the work function of the TE is an important factor on the resistive switching properties. Successive resistive switching was observed for electrode materials of Ni, Pd, and Pt. Furthermore, optimized consideration of the electrode material for RRAM is also studied.

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