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收集所有交通大學研究人員與學生個人或團體所發表之各項學術著作,涵蓋期刊論文、教師專書、學位論文等項。;;Collections of Publications of NCTU Researchers and Students Like Journal Papers and Thesis.

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Now showing 1 - 10 of 86
  • Item type:Item,
    Nitride-stressor and quantum-size engineering in Ge quantum-dot photoluminescence wavelength and exciton lifetime
    (2020-03-01)
    Kuo, Yu-Hong
    ;
    Chiu, Shih-Hsuan
    ;
    Tien, Che-Wei
    ;
    Lin, Sheng-Di
    ;
    Chang, Wen-Hao
    We report local nitride-stressor engineering in combination with quantum-size tunability in Ge quantum dots (QDs) for tailoring photoluminescence (PL) wavelength and exciton lifetime. Spherical-shaped Ge QDs with tunable diameters ranging from 25-90 nm embedded within layers of thermally-grown SiO2 and chemical-vapor-deposited Si3N4 were fabricated by thermal oxidation of lithographically-patterned poly-Si0.85Ge0.15 pillars on top of buffer layers of SiO2 and Si3N4, respectively, in a self-organization approach. The effects of local stressors and quantum confinement on the strain and optical properties of Ge QDs were systematically investigated using Raman and PL measurements. We observed that when Ge QD diameter gets smaller than 60 nm, quantum confinement sets in and has a predominant influence on PL wavelength and exciton lifetime. Our self-organized Ge QD/Si3N4 system provides a generic building block for the fabrication of active photonic devices on Si3N4 platform.
  • Item type:Item,
    Antimonidation of ultrathin epitaxial aluminum nanofilms for metamorphic growth of Sb-based structures on GaAs substrates
    (2020-04-01)
    Wu, Yu-Hsun
    ;
    Wu, Jenq-Shinn
    ;
    Lin, Sheng-Di
    ;
    電子工程學系及電子研究所
    ;
    Department of Electronics Engineering and Institute of Electronics
    The narrow-bandgap Sb-based semiconductors find their potential in various kinds of device applications such as high-speed, low-power transistors and mid-infrared diode lasers. However, epitaxial growth on the substrates that are commercially available in large sizes (for example, GaAs and Si) faces the fundamental challenge of lattice mismatch. Different from the conventional metamorphic growth employing a thick buffer, we adopt the approach of transforming an ultrathin epitaxial aluminum (Al) nanofilm into epitaxial AlSb to serve as the template for growth of antimonide structures. It is found that the process named "antimonidation" plays a critical role in Sb-based metamorphic growth. Our experimental results provide practical usefulness for growing semiconductor devices on lattice-mismatched substrates without using thick metamorphic buffer layers. (C) 2020 The Japan Society of Applied Physics
  • Item type:Item,
    Room-Temperature Macroscopic Coherence of Two Electron-Hole Plasmas in a Microcavity
    (2020-04-16)
    Jie, Qi
    ;
    Zhang, Keye
    ;
    Lai, Chih-Wei
    ;
    Hsu, Feng-Kuo
    ;
    Zhang, Weiping
    Macroscopic coherence of Bose condensates is a fundamental and practical phenomenon in many-body systems, such as the long-range correlation of exciton-polariton condensates with a dipole density typically below the exciton Mott-transition limit. Here we extend the macroscopic coherence of electron-hole-photon interacting systems to a new region in the phase diagram-the high-density plasma region, where long-range correlation is generally assumed to be broken due to the rapid dephasing. Nonetheless, a cooperative state of electron-hole plasma does emerge through the sharing of the superfluorescence field in an optical microcavity. In addition to the in situ coherence of e-h plasma, a long- range correlation is formed between two 8-mu m-spaced plasma ensembles even at room temperature. Quantized and self-modulated correlation modes are generated for e-h ensembles in the plasma region. By controlling the distance between the two ensembles, multiple coupling regimes are revealed, from strong correlation to perturbative phase correlation and finally to an incoherent classical case, which has potential implications for tunable and high-temperature-compatible quantum devices.
  • Item type:Item,
    Photon-Detection-Probability Simulation Method for CMOS Single-Photon Avalanche Diodes
    (2020-01-01)
    Hsieh, Chin-An
    ;
    Tsai, Chia-Ming
    ;
    Tsui, Bing-Yue
    ;
    Hsiao, Bo-Jen
    ;
    Lin, Sheng-Di
    Single-photon avalanche diodes (SPADs) in complementary metal-oxide-semiconductor (CMOS) technology have excellent timing resolution and are capable to detect single photons. The most important indicator for its sensitivity, photon-detection probability (PDP), defines the probability of a successful detection for a single incident photon. To optimize PDP is a cost- and time-consuming task due to the complicated and expensive CMOS process. In this work, we have developed a simulation procedure to predict the PDP without any fitting parameter. With the given process parameters, our method combines the process, the electrical, and the optical simulations in commercially available software and the calculation of breakdown trigger probability. The simulation results have been compared with the experimental data conducted in an 800-nm CMOS technology and obtained a good consistence at the wavelength longer than 600 nm. The possible reasons for the disagreement at the short wavelength have been discussed. Our work provides an effective way to optimize the PDP of a SPAD prior to its fabrication.
  • Item type:Item,
    Berezinskii-Kosterlitz-Thouless transition in an Al superconducting nanofilm grown on GaAs by molecular beam epitaxy
    (2020-05-15)
    Su, Guan-Ming
    ;
    Wu, Bi-Yi
    ;
    Fan, Yen-Ting
    ;
    Kumar, Ankit
    ;
    Chang, Chau-Shing
    We have performed extensive transport experiments on a 4 nm thick aluminum (Al) superconducting film grown on a GaAs substrate by molecular beam epitaxy (MBE). Nonlinear current-voltage (I-V) measurements on such a MBE-grown superconducting nanofilm show that V similar to I-3, which is evidence for the Berezinskii-Kosterlitz-Thouless (BKT) transition, both in the low-voltage (T-BKT 1.97 K) and high-voltage regions (T-BKT 2.17 K). In order to further study the two regions where the I-V curves are BKT-like, our experimental data are fitted to the temperature-induced vortices/antivortices unbinding model as well as the dynamical scaling theory. It is found that the transition temperature obtained in the high-voltage region is the correct T-BKT as confirmed by fitting the data to the aforementioned models. Our experimental results unequivocally show that I-V measurements alone may not allow one to determine T-BKT for superconducting transition. Therefore, one should try to fit one's results to the temperature-induced vortices/antivortices unbinding model and the dynamical scaling theory to accurately determine T-BKT in a two-dimensional superconductor.
  • Item type:Item,
    Topological Transition in a 3nm Thick Al Film Grown by Molecular Beam Epitaxy
    (2019-12-27)
    Kumar, Ankit
    ;
    Su, Guan-Ming
    ;
    Chang, Chau-Shing
    ;
    Yeh, Ching-Chen
    ;
    Wu, Bi-Yi
    We have performed detailed transport measurements on a 3nm thick (as-grown) Al film on GaAs prepared by molecular beam epitaxy (MBE). Such an epitaxial film grown on a GaAs substrate shows the Berezinskii-Kosterlitz-Thouless (BKT) transition, a topological transition in two dimensions. Our experimental data shows that the MBE-grown Al nanofilm is an ideal system for probing interesting physical phenomena such as the BKT transition and superconductivity. The increased superconductor transition temperature (similar to 2.4K) compared to that of bulk Al (1.2K), together with the ultrathin film quality, may be advantageous for future superconductor-based quantum devices and quantum information technology.
  • Item type:Item,
    Nano- to atomic-scale epitaxial aluminum films on Si substrate grown by molecular beam epitaxy
    (2019-10-01)
    Tsai, Yi-Hsun
    ;
    Wu, Yu-Hsun
    ;
    Ting, Yen-Yu
    ;
    Wu, Chu-Chun
    ;
    Wu, Jenq-Shinn
    We demonstrate nano-to atomic-scale epitaxial aluminum film growth on Si(111) substrate by molecular beam epitaxy. Excellent quality of these aluminum films, including sub-nanometer surface roughness, narrow linewidth of X-ray diffraction peak, clear transmission electron diffraction, and high optical reflectivity in ultra-violet, have been obtained with a reproducible growth recipe. The atomic-scale metallic aluminum film is formed by the self-limiting oxidation on the 3-nm-thick sample in air and the metallic state is confirmed with X-ray photoemission spectroscopy. Our work paves the way to future integration of aluminum-based plasmonic and superconducting devices on Si platform. (c) 2019 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
  • Item type:Item,
    Single-crystalline aluminum film for ultraviolet plasmonic nanolasers
    (2016-01-27)
    Chou, Bo-Tsun
    ;
    Chou, Yu-Hsun
    ;
    Wu, Yen-Mo
    ;
    Chung, Yi-Cheng
    ;
    Hsueh, Wei-Jen
    Significant advances have been made in the development of plasmonic devices in the past decade. Plasmonic nanolasers, which display interesting properties, have come to play an important role in biomedicine, chemical sensors, information technology, and optical integrated circuits. However, nanoscale plasmonic devices, particularly those operating in the ultraviolet regime, are extremely sensitive to the metal and interface quality. Thus, these factors have a significant bearing on the development of ultraviolet plasmonic devices. Here, by addressing these material-related issues, we demonstrate a low-threshold, high-characteristic-temperature metal-oxide-semiconductor ZnO nanolaser that operates at room temperature. The template for the ZnO nanowires consists of a flat single-crystalline Al film grown by molecular beam epitaxy and an ultrasmooth Al2O3 spacer layer synthesized by atomic layer deposition. By effectively reducing the surface plasmon scattering and metal intrinsic absorption losses, the high-quality metal film and the sharp interfaces formed between the layers boost the device performance. This work should pave the way for the use of ultraviolet plasmonic nanolasers and related devices in a wider range of applications.
  • Item type:Item,
    Spin-orbit-coupled superconductivity
    (2014-06-25)
    Lo, Shun-Tsung
    ;
    Lin, Shih-Wei
    ;
    Wang, Yi-Ting
    ;
    Lin, Sheng-Di
    ;
    Liang, C. -T.
    Superconductivity and spin-orbit (SO) interaction have been two separate emerging fields until very recently that the correlation between them seemed to be observed. However, previous experiments concerning SO coupling are performed far beyond the superconducting state and thus a direct demonstration of how SO coupling affects superconductivity remains elusive. Here we investigate the SO coupling in the critical region of superconducting transition on Al nanofilms, in which the strength of disorder and spin relaxation by SO coupling are changed by varying the film thickness. At temperatures T sufficiently above the superconducting critical temperature T-c, clear signature of SO coupling reveals itself in showing a magneto-resistivity peak. When T < T-c, the resistivity peak can still be observed; however, its line-shape is now affected by the onset of the quasi two-dimensional superconductivity. By studying such magneto-resistivity peaks under different strength of spin relaxation, we highlight the important effects of SO interaction on superconductivity.
  • Item type:Item,
    Atomic-scale epitaxial aluminum film on GaAs substrate
    (2017-07-01)
    Fan, Yen-Ting
    ;
    Lo, Ming-Cheng
    ;
    Wu, Chu-Chun
    ;
    Chen, Peng-Yu
    ;
    Wu, Jenq-Shinn
    Atomic-scale metal films exhibit intriguing size-dependent film stability, electrical conductivity, superconductivity, and chemical reactivity. With advancing methods for preparing ultra-thin and atomically smooth metal films, clear evidences of the quantum size effect have been experimentally collected in the past two decades. However, with the problems of small-area fabrication, film oxidation in air, and highly-sensitive interfaces between the metal, substrate, and capping layer, the uses of the quantized metallic films for further ex-situ investigations and applications have been seriously limited. To this end, we develop a large-area fabrication method for continuous atomic-scale aluminum film. The self-limited oxidation of aluminum protects and quantizes the metallic film and enables ex-situ characterizations and device processing in air. Structure analysis and electrical measurements on the prepared films imply the quantum size effect in the atomic-scale aluminum film. Our work opens the way for further physics studies and device applications using the quantized electronic states in metals. (C) 2017 Author(s).