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收集所有交通大學研究人員與學生個人或團體所發表之各項學術著作，涵蓋期刊論文、教師專書、學位論文等項。;;Collections of Publications of NCTU Researchers and Students Like Journal Papers and Thesis.

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Author: search.filters.author.Luo, GLSubject: search.filters.subject.Ge

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    Growth of high-quality Ge epitaxial layers on Si(100)
    (2003-05-15)
    Luo, GL
    ;
    Yang, TH
    ;
    Chang, EY
    ;
    Chang, CY
    ;
    Chao, KA
    A method of growing high-quality epitaxial Ge layers on a Si(100) substrate is reported. In this method, a 0.8 mum Si0.1Ge0.9 layer was first grown. Due to the large lattice mismatch between this layer and the Si substrate, many dislocations form near the interface and in the lower part of the Si0.1Ge0.9 layer. A 0.8 mum Si0.05Ge0.95 layer and a 1.0 mum top Ge layer were subsequently grown on the Si0.1Ge0.9 layer. The formed interfaces of Si0.05Ge0.95/Si0.1Ge0.9 and Ge/Si0.05Ge0.95 can bend and terminate the upward-propagated dislocations very effectively. The in situ annealing process was also performed for each individual layer. Experimental results show that the dislocation density in the top Ge layer can be greatly reduced, and the surface is very smooth, while the total thickness of the structure is only 2.6 mum.
  • Thumbnail Image
    Item type:Item,
    Controlled placement of self-organized Ge dots on patterned Si (001) surfaces
    (2004-02-15)
    Lee, HM
    ;
    Yang, TH
    ;
    Luo, GL
    ;
    Chang, EY
    ;
    材料科學與工程學系
    The positioning and ordering of the self-organized Ge dots were controlled using the ultra high-vacuum chemical molecular epitaxial growth of Ge on electron beam lithographically patterned Si (001) substrates. The experimental results indicate that the edge smoothness of the etched Si holes affects the distribution and long-range ordering of the Ge dots formed. With optimized etching conditions, the Ge dots can be grown uniformly on the edges of the holes etched on the patterned Si substrates. The sizes of the Ge dots are approximately 10 nm. The proposed, technique can be applied to the fabrication of regimented arrays in signal processing applications.