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收集所有交通大學研究人員與學生個人或團體所發表之各項學術著作，涵蓋期刊論文、教師專書、學位論文等項。;;Collections of Publications of NCTU Researchers and Students Like Journal Papers and Thesis.

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Now showing 1 - 6 of 6
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    Raman and X-ray studies of InN films grown at different temperatures by metalorganic vapor phase epitaxy
    (1998-09-01)
    Chen, WK
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    Lin, HC
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    Pan, YC
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    Ou, J
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    Shu, CK
    We used Raman scattering and X-ray diffraction (XRD) methods to investigate the properties of InN films deposited at temperatures ranging from 325 to 600 degrees C by metalorganic vapor phase epitaxy (MOVPE). Significant line broadening, softening and intensity evolution were observed from films at growth temperatures between 375 and 450 degrees C. This can be attributed to the formation of mixed hexagonal and cubic structures and related dislocation defects. As the growth temperature was further increased, the hexagonal phase tvas found to be dominant in the deposited InN film.
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    Growth and optical properties of high-density InN nanodots
    (2010-10-15)
    Ke, W. C.
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    Lee, S. J.
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    Kao, C. Y.
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    Chen, W. K.
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    Chou, W. C.
    High density InN/GaN nanodots were grown by pulsed mode (PM) metal-organic chemical vapor deposition (MOCVD). InN nanodots density of up to similar to 5 x 10(10) cm(-2) at a growth temperature of 550 degrees C was achieved. The high diffusion activation energy of 2.65 eV due to high NH(3) flow rate generated more reactive nitrogen adatoms on the growth surface, and is believed to be the main reason for the growth of high density InN nanodots. In addition, an anomalous temperature dependence of the PL peak energy was observed for high density InN nanodots. The high carrier concentration, due to high In vacancy (V(ln)) in the InN nanodots, thermally agitated to the conduction band. As the measurement temperature increased, the increase of Fermi energy resulted in blue-shifted PL peak energy. From the Arrhenius plot of integrated PL intensity, the thermal activation energy for the PM grown InN nanodots was estimated to be E(a)similar to 51 meV, indicating strong localization of carriers in the high density InN nanodots. (C) 2010 Elsevier B.V. All rights reserved.
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    Influence of sapphire nitridation on properties of indium nitride prepared by metalorganic vapor phase epitaxy
    (1999-02-01)
    Pan, YC
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    Lee, WH
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    Shu, CK
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    Lin, HC
    ;
    Chiang, CI
    Indium nitride films have been successfully grown on (0001) sapphire substrates by metalorganic vapor phase epitaxy (MOVPE) using TMIn and NH3 as source precursors. Experimental results indicated that pregrowth treatments, such as buffer layer growth, nitridation temperature and nitridation duration have dramatic effects on the growth of the InN films. For films nitridated at 1,000 degrees C for 40 min without any buffer layer growth, we obtained an InN film quality with Hall mobility, carrier concentration and line width of Raman E-2 mode of 270 cm(2)/V.s, 5 x 10(19) cm(-3) and 4.5 cm(-1), respectively, which is among the best quality ever reported for such type of film grown by MOVPE.
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    Influence of the GaN capping thickness on the strain and photoluminescence properties of InN/GaN quantum dots
    (2013-02-01)
    Ke, Wen-Cheng
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    Wu, Yue-Han
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    Houng, Wei-Chung
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    Wei, Chih-An
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    材料科學與工程學系
    InN quantum dots (QDs) were grown on 1 mu m thick GaN/(0001) sapphire substrates by low pressure metal organic chemical vapor deposition. A single crystalline 10-nm thick GaN capping layer was achieved on the InN QDs by the flow-rate modulation epitaxy method at 650 degrees C. The (002) omega/2 theta scans of the X-ray diffraction measurements show that the reduction of the lattice constant with a capping thickness indicate that the GaN capping process exerts a compressive strain on the InN QDs. The residual strain was reduced from 0.245% to -0.245% as the GaN cap thickness increases from 0 to 20 nm. In addition, the analysis of the photoluminescence peak energy estimated that the free electron concentration (i.e. density of indium (In) vacancy) decreased from 1.62x10(18) cm(-3) to 1.24x10(18) cm(-3). The suggestion here is that the increase of the compressive strain on InN QDs due to the increased GaN capping layer thickness provides the high driving force for the interdiffusion of the In atom and gallium (Ga) atoms between the interface of InN QDs and the GaN capping layer. Thus, we believe that more Ga atoms can diffuse from the GaN capping layer and substitute the high density of In vacancy in the InN QDs, resulting in a decrease of the free electron concentration in the InN QDs with the increase in the GaN capping layer thickness. (C) 2012 Elsevier B.V. All rights reserved.
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    Study of InN epitaxial films and nanorods grown on GaN template by RF-MOMBE
    (2012-08-21)
    Chen, Wei-Chun
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    Kuo, Shou-Yi
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    Wang, Wei-Lin
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    Tian, Jr-Sheng
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    Lin, Woei-Tyng
    This paper reports on high-quality InN materials prepared on a GaN template using radio-frequency metalorganic molecular beam epitaxy. We also discuss the structural and electro-optical properties of InN nanorods/films. The X-ray diffraction peaks of InN(0002) and InN(0004) were identified from their spectra, indicating that the (0001)-oriented hexagonal InN was epitaxially grown on the GaN template. Scanning electron microscopic images of the surface morphology revealed a two-dimensional growth at a rate of approximately 0.85 mu m/h. Cross-sectional transmission electron microscopy images identified a sharp InN/GaN interface and a clear epitaxial orientation relationship of [0001](InN) // [0001](GaN) and ((2) over bar 110)(InN) // ((2) over bar 110)(GaN). The optical properties of wurtzite InN nanorods were determined according to the photoluminescence, revealing a band gap of 0.77 eV.
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    Strong ultraviolet emission from InGaN/AlGaN multiple quantum well grown by multi-step process
    (2007-04-01)
    Chen, Hou-Guang
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    Hsu, Nai-Fang
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    Chu, Jung-Tang
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    Yao, Hsin-Hung
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    Lu, Tien-Chang
    We propose a method of realizing strong ultraviolet emission from InGaN/AlGaN multiple quantum wells (MQWs) grown by a multi-step process. During growth of the quantum well layer, only trimethylindium (TMIn) and ammonia were introduced into the reactor, followed by a growth interruption treatment before growth of AlGaN barriers. The growth temperature of QWs dominates the photoluminescence (PL) emission peak position and surface morphologies of the films. It was found that the PL spectra of the samples with MQWs grown at 685 degrees C showed a strong UV emission at 380 nm. The correlation between surface structures and optical characteristics was studied by cathodoluminescence microscopy. The electroluminescence spectra under various injection currents showed a weak carrier localization effect induced by a quantum-confined Stark effect in the MQW.