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A Model for Neutral Defect Limited Electron Mobility in Strained-Silicon Inversion Layers
(2017-03-01)
Hsieh, Shang-Hsun
;
Chen, Ming-Jer
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
On the strained silicon metal-oxide-semiconductor field-effect transistors (MOSFETs), we show how to derive a formalism dealing with the scattering of a 2-D electron by a neutral defect. The corresponding neutral defect limited inversion-layer electron mobility, mu(n), is calculated in the momentum relaxation time approximation. The calculated results lead to a new analytical model: mu(n) = cN(n)(-1) where N-n is the neutral defect density per unit area and c is the coefficient independent of the inversion-layer density, the strain, and the temperature. The validity and applicability of the model are confirmed by citing three independent experiments on strained silicon MOSFETs undergoing different implantation sources and different annealing budgets. Importantly, this paper clarifies for the first time that strain will not change neutral defect limited mobility unless changing the neutral defect density. This reasonably explains the two experimental observations during implantation and annealing: 1) the implantation-induced strain relaxation in strained sample does not occur and 2) the neutral defect density is much higher in strained sample than in unstrained sample.
Portable movement modeling for PCS networks
(2000-07-01)
Fang, YG
;
Chlamtac, I
;
Lin, YB
;
資訊工程學系
;
Department of Computer Science
In this paper, we propose a nem model for the portable movement in personal communications services (PCSs) networks. Based on this model with general interservice time and registration area residence time distributions, analytic expression for the probability that a portable mores across K registration areas (RAs) is obtained. Busy-line effect on this quantity is also studied and analytic expression is presented, The result given in this paper is very useful for the cost analysis for location updating and paging.
The effects of super-steep-retrograde indium channel profile on deep submicron n-channel metal-oxide-semiconductor field-effect transistor
(2001-01-01)
Chen, CM
;
Chang, SJ
;
Chou, JW
;
Lin, T
;
Yeh, WK
A complete study on the effects of indium channel implant energy on transistor characteristics including carrier mobility, drain current, drain induce barrier lowering (DIBL), device breakdown, junction leakage, impact ionization rate and hot-carrier degradation were performed on 0.1 mum devices. It was found that devices with super-steep-retrograde (SSR) indium channel profile depict higher transconductance in linear region, albeit the saturation drive current is lower, compared to the conventional BF2-doped control. In addition, In-doped devices also depict improved DIBL, I-on-I-off current ratio and transistor breakdown voltage. Finally, by increasing the indium implant energy, devices depict an improved transconductance, reduced DIBL and hot-carrier degradation, while suffering larger junction leakage and capacitance.
Characterization of p-type InxGa1-xN grown by metalorganic chemical vapor deposition
(2001-03-01)
Wen, TC
;
Lee, WI
;
Sheu, JK
;
Chi, GC
;
友訊交大聯合研發中心
This study investigates the electrical and optical characteristics of Mg-doped InxGa1-xN grown by metalorganic chemical vapor deposition. All the Mg-doped InxGa1-xN layers show p-type conduction after thermal annealing. Room temperature (RT) carrier concentration increases exponentially with an In mole fraction increase. The highest hole concentration of bull; Mg-doped InxGa1-xN is 1.65 x 10(19) cm(-3). Also, the RT photoluminescence (PL) spectra of Mg related emissions in InxGa1-xN are displayed. However, the PL peak intensity becomes weak after the post-annealing process on Mg-doped InxGa1-xN. This degradation might be created by the surface dissociation during the post-annealing process. (C) 2001 Elsevier Science Ltd. All rights reserved.
High Mobility Bilayer Metal-Oxide Thin Film Transistors Using Titanium-Doped InGaZnO
(2014-01-01)
Hsu, Hsiao-Hsuan
;
Chang, Chun-Yen
;
Cheng, Chun-Hu
;
Chiou, Shan-Haw
;
Huang, Chiung-Hui
We report a high performance indium-gallium-zinc oxide (IGZO)/IGZO:Ti bilayer metal-oxide thin-film transistor (TFT) with a low drive voltage of <2 V. Compared with conventional IGZO TFTs, the novel bilayer metal-oxide TFTs through IGZO thickness modulation can reach the lowest off current of 1.6 x 10(-11) A, smallest sub-threshold swing of 73 mV/decade, and highest mobility of 63 cm(2)/Vs, which may create the potential application for high resolution display.
Probing Long-Range Coulomb Interactions in Nanoscale MOSFETs
(2013-12-01)
Chen, Ming-Jer
;
Chang, Li-Ming
;
Wei, Sih-Yun
;
Chen, Wan-Li
;
Yeh, Ting-Hsien
We have recently experimentally probed long-range Coulomb interactions due to plasmons in polysilicon gate of long-channel (1 mu m) MOSFETs. In this letter, we further probe those due to plasmons in the highly doped source and drain. Test vehicles include four more samples from the same manufacturing process but with small channel lengths (down to 33 nm). I-V's of devices are measured at two drain voltages of 0.05 and 1 V, in a temperature range of 292-380 K. Inverse modeling technique is applied to furnish calibrated doping profiles. The inversion layer electron effective mobility is thereby extracted, showing a decreasing trend with decreasing channel length. Such differences reflect more additional scatterers in the shorter devices. Mobility components limited by these additional scatterers are assessed using Matthiessen's rule. From the extracted temperature dependencies, we infer that the strength of source/drain plasmons increases with decreasing channel length. The errors of Matthiessen's rule are adequately dealt with. Corroborative evidence is given as well.
An Anomalous Conductance Decrease in Charge Sensitive Infrared Phototransistor
(2013-01-01)
Kang, Ting-Ting
;
Komiyama, Susumu
;
Ueda, Takeji
;
Lin, Shi-Wei
;
Lin, Sheng-Di
For charge-sensitive infrared phototransistors (CSIP), it is observed that "conductance decrease," which is contrary to the standard "conductance increase" photon response, can also happen after absorbing infrared light. By experimental modeling the charge-up detection mechanism of CSIP via a capacitive way, we clarify that " conductance decrease" should be attributed to the significantly reduced low quantum well electron mobility after the photon-charging process, rather than a reversed electron transfer. This experimental result clearly indicates that photon-induced charges are able to modify the electron mobility in those "charge-sensitive sensor" types of semiconductor quantum single-photon detectors.
Error-Free Matthiessen's Rule in the MOSFET Universal Mobility Region
(2013-02-01)
Chen, Ming-Jer
;
Lee, Wei-Han
;
Huang, Yi-Hui
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
Through the experimentally validated inversion-layer mobility simulation, we devise an error-free version of Matthiessen's rule for a single-gate n-channel bulk MOSFET in the universal mobility region. The core of the new rule lies in a semi-empirical model, which explicitly expresses the errors due to the conventional use of Matthiessen's rule as a function of both the lowest subband population and the relative strength of individual mobility components. The model holds under practical conditions (with temperatures up to 400 K) and in a broad range of substrate doping concentrations (10(14) to 10(18) cm(-3)). To make the error-free proposal more general, we elaborate on several issues, including strain, impurity Coulomb scattering, and remote scattering. The thin-film case can be treated accordingly.
Effect of Strained k . p Deformation Potentials on Hole Inversion-Layer Mobility
(2013-04-01)
Chen, Ming-Jer
;
Lee, Chien-Chih
;
Chen, Wan-Li
;
電子工程學系及電子研究所
;
Department of Electronics Engineering and Institute of Electronics
In the literature dedicated to strained p-type metal-oxide-semiconductor field-effect transistor inversion-layer mobility calculation via a k . p valence-band structure, three key strain-related material parameters, namely, the Bir-Pikus deformation potentials a(upsilon), b, and d, were widespread in magnitude. To improve such large discrepancies, in this paper, we conduct sophisticated calculations on < 110 >/(001) and < 110 >/(110) hole inversion-layer mobility for gigapascal-level uniaxial stresses along each of three crystallographic directions. The screening effect on surface roughness scattering is taken into account. We find that, to affect the calculated hole mobility enhancement, a(upsilon) is weak, b is moderate, and d is strong, particularly for the uniaxial compressive stress along the < 110 > direction. This provides experimental guidelines for an optimal determination of the primary factor, i.e., d, and the secondary factor, i.e., b, with the commonly used values for a(upsilon). The result remains valid for varying surface roughness parameters and models and is supported by recent first-principles and tight-binding calculations. Thus, the strained k . p valence-band structure with the optimized deformation potentials can ensure the accuracy of the calculated transport properties of 2-D hole gas under stress.
Media-Independent Handover Design for Seamless Mobility in Heterogeneous WiMAX/Wi-Fi Networks
(2012-10-01)
Shih, Chen-Hua
;
Kuo, Jun-Li
;
Ho, Cheng-Yuan
;
Chen, Yaw-Chung
;
友訊交大聯合研發中心
As we are moving toward next generation wireless networks, we are facing the integration of heterogeneous access networks. The main challenge is to provide mobile users moving freely across different radio access technologies with satisfactory quality of services for a variety of applications. Consequently, the seamless roaming over heterogeneous networks is an important concern. To minimize the disruption to the ongoing session when a mobile user is moving from one access network to another, we propose a framework that integrates IEEE 802.11 WLANs and IEEE 802.16 WMANs based on the IEEE 802.21, so-called Media Independent Handover (MIH), to facilitate both homogeneous and heterogeneous handovers. Both numerical analysis and simulation results show that seamless roaming between WLAN and WMAN can be achieved and much better performance can be obtained compared with the IEEE 802.21 standard approach.

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