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dc.contributor.authorChen, C. H.en_US
dc.contributor.authorChang, T. C.en_US
dc.contributor.authorLiao, I. H.en_US
dc.contributor.authorXi, P. B.en_US
dc.contributor.authorTsai, C. T.en_US
dc.contributor.authorYang, P. Y.en_US
dc.contributor.authorHsieh, Joeen_US
dc.contributor.authorChen, Jasonen_US
dc.contributor.authorChen, U. S.en_US
dc.contributor.authorChen, J. R.en_US
dc.date.accessioned2014-12-08T15:12:58Z-
dc.date.available2014-12-08T15:12:58Z-
dc.date.issued2007-12-03en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2803937en_US
dc.identifier.urihttp://hdl.handle.net/11536/10015-
dc.description.abstractA supercritical CO(2) (SCCO(2)) fluid technique is proposed to improve electrical characteristics for W nanocrystal nonvolatile memory devices, since the thickness and quality of tunnel oxide are critical issues for the fabrication of nonvolatile memory devices. After SCCO(2) treatments, C-V curves are restored to normal, as well as the leakage current of W nanocrystal memory devices are reduced significantly. It reveals that W nanocrystal memory devices could be formed with shorter oxidation time, moreover, dangling bonds and trapping states initially created within an incomplete oxidized film will be efficiently repaired after SCCO(2) treatment. (c) 2007 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleTungsten nanocrystal memory devices improved by supercritical fluid treatmenten_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.2803937en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume91en_US
dc.citation.issue23en_US
dc.citation.epageen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000251450600048-
dc.citation.woscount10-
Appears in Collections:Articles


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