完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Yang, Chao-Chen | en_US |
dc.contributor.author | Chang, Feng-Chih | en_US |
dc.contributor.author | Wang, Yen-Zen | en_US |
dc.contributor.author | Chan, Chia-Ming | en_US |
dc.contributor.author | Lin, Chen-Lung | en_US |
dc.contributor.author | Chen, Wen-Yi | en_US |
dc.date.accessioned | 2014-12-08T15:13:04Z | - |
dc.date.available | 2014-12-08T15:13:04Z | - |
dc.date.issued | 2007-12-01 | en_US |
dc.identifier.issn | 1022-9760 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1007/s10965-007-9115-9 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/10075 | - |
dc.description.abstract | A reactive and nanoporous particle (OG) was introduced to UV-cured epoxy resin to form great low D-k material for electronic industrial. We expected the porous cage of OG to decrease the dielectric constant of UV-cured epoxy resin and multiple reactive functional groups (oxirane ring) of OG reacted with photoinitiator to increase the curing density of UV-cured epoxy resin. The glass transition temperatures (T-g) of epoxy increases with the increase of the OG content up to 10 phr due to the increase of crosslinking density. Excessive aggregation at highest OG content of 15 phr results in the reduced crosslinking density and T-g. The char yield of the composite increases with increase of OG content because stable Si and SiO2 are formed after thermal decomposition. The presence of OG results in the higher porosity and thus the lower dielectric constant. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | POSS | en_US |
dc.subject | dielectric constant | en_US |
dc.subject | thermal properties | en_US |
dc.subject | epoxy resin | en_US |
dc.subject | nanocomposites | en_US |
dc.title | Novel nanocomposite of epoxy resin by introduced reactive and nanoporous material | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1007/s10965-007-9115-9 | en_US |
dc.identifier.journal | JOURNAL OF POLYMER RESEARCH | en_US |
dc.citation.volume | 14 | en_US |
dc.citation.issue | 6 | en_US |
dc.citation.spage | 431 | en_US |
dc.citation.epage | 439 | en_US |
dc.contributor.department | 應用化學系 | zh_TW |
dc.contributor.department | Department of Applied Chemistry | en_US |
dc.identifier.wosnumber | WOS:000250920200001 | - |
dc.citation.woscount | 18 | - |
顯示於類別: | 期刊論文 |