標題: | Modified resistive switching behavior of ZrO2 memory films based on the interface layer formed by using Ti top electrode |
作者: | Lin, Chih-Yang Wu, Chung-Yi Wu, Chen-Yu Tseng, Tseung-Yuen Hu, Chenming 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 1-十一月-2007 |
摘要: | The influence of Ti top electrode material on the resistive switching properties of ZrO2-based memory film using Pt as bottom electrode was investigated in the present study. When Ti is used as top electrode, the resistive switching behavior becomes dependent on bias polarity and no current compliance is needed during switching into high conducting state. This phenomenon is attributed to the fact that a series resistance between Ti and ZrO2 film, composed of a TiOx layer, a ZrOy layer, and even the contact resistance, imposed a current compliance on the memory device. Besides, our experimental results imply that switching the device into high conducting state is a field driven process while switching back into low conducting state is a current driven process. (c) 2007 American Institute of Physics. |
URI: | http://dx.doi.org/10.1063/1.2802990 http://hdl.handle.net/11536/10196 |
ISSN: | 0021-8979 |
DOI: | 10.1063/1.2802990 |
期刊: | JOURNAL OF APPLIED PHYSICS |
Volume: | 102 |
Issue: | 9 |
結束頁: | |
顯示於類別: | 期刊論文 |