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dc.contributor.authorChen, Chienchihen_US
dc.contributor.authorBai, Hsunlingen_US
dc.contributor.authorChang, Chungliangen_US
dc.date.accessioned2014-12-08T15:13:14Z-
dc.date.available2014-12-08T15:13:14Z-
dc.date.issued2007-10-25en_US
dc.identifier.issn1932-7447en_US
dc.identifier.urihttp://dx.doi.org/10.1021/jp0716233en_US
dc.identifier.urihttp://hdl.handle.net/11536/10223-
dc.description.abstractThe atmospheric pressure plasma enhanced nanoparticle synthesis (APPENS) process is applied to produce nitrogen (N) doped titania (TiO2) photocatalysts. With TTIP (titanium tetraisopropoxide; Ti(OC3H7)(4)) and water vapors as precursors, the effect of plasma and annealing gas composition on the N-doping status is identified by a cross comparison of the chemical shift of N atoms with those of Ti and O atoms. The activities of various types of N-doped photocatalysts are evaluated via the conversion of isopropyl alcohol (IPA). The results show that the N-doped TiO2 particles with O-x-Ti-N-y and -(NO) dopants are produced via N-2 plasma gas followed by air or N2 annealing gases. They have better visible and UV photocatalytic activities compared to the pure TiO2 photocatalysts prepared under O-2/Ar plasma and annealing gases. On the other hand, the N-doped TiO2 photocatalyst produced under N-2/O-2/Ar plasma gas and then annealed with pure N2 gas tends to have an additional dopant of -(NO2), but its photocatalytic activity is even worse than those of the pure TiO2 photocatalysts. The results reveal that the Ox-Ti-Ny and -(NO) dopants may have positive effects on the visible light photocatalytic activity while the -(NO2) dopant tends to have a negative effect on the visible light photocatalytic activity.en_US
dc.language.isoen_USen_US
dc.titleEffect of plasma processing gas composition on the nitrogen-doping status and visible light photocatalysis of TiO2en_US
dc.typeArticleen_US
dc.identifier.doi10.1021/jp0716233en_US
dc.identifier.journalJOURNAL OF PHYSICAL CHEMISTRY Cen_US
dc.citation.volume111en_US
dc.citation.issue42en_US
dc.citation.spage15228en_US
dc.citation.epage15235en_US
dc.contributor.department環境工程研究所zh_TW
dc.contributor.departmentInstitute of Environmental Engineeringen_US
dc.identifier.wosnumberWOS:000250438900015-
dc.citation.woscount64-
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