標題: | Optimal design of integrally gated CNT field-emission devices using a genetic algorithm |
作者: | Chen, P. Y. Chen, C. H. Wu, J. S. Wen, H. C. Wang, W. P. 機械工程學系 資訊工程學系 Department of Mechanical Engineering Department of Computer Science |
公開日期: | 3-十月-2007 |
摘要: | A method to optimize the focusing quality of integrally gated CNT field- emission ( FE) devices by combining field- emission modeling and a computational intelligence technique, genetic algorithm ( GA), is proposed and demonstrated. In this work, the e- beam shape, as a characteristic parameter of electron- optical properties, is calculated by field- emission simulation modeling. Using a design tool that combines GA and physical modeling, a set of structural and electrical parameters for four FE device groups, including double- gate, triple- gate, quadruple- gate and quintuple- gate type, were optimized. The resultant FE devices exhibit satisfactory e- beam focusabilities and the extracted parameters with the best performance for each type of FE device were represented to be fabricated by a VLSI technique. The GA- based automatic design parameter extraction will significantly benefit the design of integrated electron- optical systems for versatile vacuum micro- and nano-electronic applications. |
URI: | http://dx.doi.org/10.1088/0957-4484/18/39/395203 http://hdl.handle.net/11536/10246 |
ISSN: | 0957-4484 |
DOI: | 10.1088/0957-4484/18/39/395203 |
期刊: | NANOTECHNOLOGY |
Volume: | 18 |
Issue: | 39 |
結束頁: | |
顯示於類別: | 期刊論文 |