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dc.contributor.authorTaneichi, Takashien_US
dc.contributor.authorKobayashi, Takayoshien_US
dc.date.accessioned2014-12-08T15:13:20Z-
dc.date.available2014-12-08T15:13:20Z-
dc.date.issued2007-09-27en_US
dc.identifier.issn1089-5639en_US
dc.identifier.urihttp://dx.doi.org/10.1021/jp074158ien_US
dc.identifier.urihttp://hdl.handle.net/11536/10312-
dc.description.abstractDependence of efficiency in all-optical poling with nonlinear processes, up to eighth order, is considered. The explicit form of the nonlinear susceptibility that is responsible for the poling is derived, which shows both CEP and phase mismatch dependence. On the basis of an analysis of pulse propagation in a nonlinear material, it is shown that one can identify the order of nonlinearity that is relevant to the poling process, relying on current technology of CEP stabilization and thin-film growth.en_US
dc.language.isoen_USen_US
dc.titleTheoretical investigation of carrier envelope phase dependence of all-optical poling with the third- and higher-order nonlinear processesen_US
dc.typeArticleen_US
dc.identifier.doi10.1021/jp074158ien_US
dc.identifier.journalJOURNAL OF PHYSICAL CHEMISTRY Aen_US
dc.citation.volume111en_US
dc.citation.issue38en_US
dc.citation.spage9613en_US
dc.citation.epage9617en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000249655600057-
dc.citation.woscount0-
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