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dc.contributor.author陳慶耀en_US
dc.contributor.author巫文良en_US
dc.date.accessioned2014-12-16T06:12:04Z-
dc.date.available2014-12-16T06:12:04Z-
dc.date.issued2012-09-16en_US
dc.identifier.govdocB05C009/08zh_TW
dc.identifier.govdocH01L021/30zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/103389-
dc.description.abstract本發明提供一種塗佈裝置、塗佈方法以及控制磁性流體之方法,其是利用一徑向磁場施加於一磁性流體,以驅使磁性流體自徑向磁場之中心往外輻射狀延展,藉以避免旋轉塗佈技術所產生的問題。zh_TW
dc.language.isozh_TWen_US
dc.title塗佈裝置、塗佈方法以及控制磁性流體之方法zh_TW
dc.typePatentsen_US
dc.citation.patentcountryTWNzh_TW
dc.citation.patentnumber201236768zh_TW
Appears in Collections:Patents


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