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dc.contributor.authorChen, J. F.en_US
dc.contributor.authorWang, Y. Z.en_US
dc.contributor.authorChiang, C. H.en_US
dc.contributor.authorHsiao, R. S.en_US
dc.contributor.authorWu, Y. H.en_US
dc.contributor.authorChang, L.en_US
dc.contributor.authorWang, J. S.en_US
dc.contributor.authorChi, T. W.en_US
dc.contributor.authorChi, J. Y.en_US
dc.date.accessioned2014-12-08T15:13:22Z-
dc.date.available2014-12-08T15:13:22Z-
dc.date.issued2007-09-05en_US
dc.identifier.issn0957-4484en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0957-4484/18/35/355401en_US
dc.identifier.urihttp://hdl.handle.net/11536/10341-
dc.description.abstractStrain relaxation in InAs/InGaAs quantum dots (QDs) is shown to introduce misfits in the QD and neighboring GaAs bottom layer. A capacitance -voltage profiling shows an electron accumulation peak at the QD with a long emission time, followed by additional carrier depletion caused by the misfits in the GaAs bottom layer. The emission-time increase is explained by the suppression of tunneling for the QD excited states due to the additional carrier depletion. As a result, electrons are thermally activated from the QD states to the GaAs conduction band, consistent with observed emission energies of 0.160 and 0.068 eV which are comparable to the confinement energies of the QD electron ground and first-excited states, respectively, relative to the GaAs conduction band. This is in contrast to non-relaxed samples in which emission energy of 60 meV is observed, corresponding to the emission from the QD ground state to the first-excited state.en_US
dc.language.isoen_USen_US
dc.titleRelaxation-induced lattice misfits and their effects on the emission properties of InAs quantum dotsen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0957-4484/18/35/355401en_US
dc.identifier.journalNANOTECHNOLOGYen_US
dc.citation.volume18en_US
dc.citation.issue35en_US
dc.citation.epageen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000249278300008-
dc.citation.woscount7-
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