Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Ker, Ming-Dou | en_US |
dc.contributor.author | Chang, Wei-Jen | en_US |
dc.date.accessioned | 2014-12-08T15:13:23Z | - |
dc.date.available | 2014-12-08T15:13:23Z | - |
dc.date.issued | 2007-09-01 | en_US |
dc.identifier.issn | 1530-4388 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1109/TDMR.2007.907423 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/10354 | - |
dc.description.abstract | A new electrostatic discharge (ESD) protection structure of high-voltage p-type silicon-controlled rectifier (HVPSCR) that is embedded into a high-voltage p-channel MOS (HVPMOS) device is proposed. to greatly improve the ESD robustness of the vacuum-fluorescent-display (VFD) driver IC for automotive electronics applications. By only adding the additional n+ diffusion into the drain region of HVPMOS, the transmission-line-pulsing-measured secondary breakdown current of the output driver has been greatly improved to be greater than 6 A in a 0.5-mu m high-voltage complementary MOS process. Such ESD-enhanced VFD driver IC, which can sustain human-body-model ESD stress of up to 8 W, has been in mass production for automotive applications in cars without the latchup problem. Moreover, with device widths of 500, 600, and 800 mu m, the machine-model ESD levels of the HVPSCR are as high as 1100, 1300, and 1900 V, respectively. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | electrostatic discharge (ESD) | en_US |
dc.subject | high-voltage p-type silicon-controlled rectifier (HVPSCR) | en_US |
dc.subject | human body model (HBM) | en_US |
dc.subject | machine model (MM) | en_US |
dc.subject | secondary breakdown current (It2) | en_US |
dc.subject | vacuum fluorescent display (VFD) | en_US |
dc.title | On-chip ESD protection design for automotive vacuum-fluorescent-display (VFD) driver IC to sustain high ESD stress | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1109/TDMR.2007.907423 | en_US |
dc.identifier.journal | IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY | en_US |
dc.citation.volume | 7 | en_US |
dc.citation.issue | 3 | en_US |
dc.citation.spage | 438 | en_US |
dc.citation.epage | 445 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000252913700006 | - |
dc.citation.woscount | 2 | - |
Appears in Collections: | Articles |
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