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dc.contributor.author張翼en_US
dc.contributor.author呂宗育en_US
dc.date.accessioned2014-12-16T06:12:27Z-
dc.date.available2014-12-16T06:12:27Z-
dc.date.issued2011-03-16en_US
dc.identifier.govdocH01L029/778zh_TW
dc.identifier.govdocH01L029/812zh_TW
dc.identifier.govdocH01L021/334zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/103632-
dc.description.abstract提供一種具有高氮含量氮化鎢蕭特基閘極接觸之HEMT氮化鎵電晶體,在基底上依序具有氮化鎵層、氮化鋁鎵層、蕭特基閘極以及位於閘極兩側之源極與汲極。其中蕭特基閘極的材料為氮莫耳百分比為0.5之氮化鎢。zh_TW
dc.language.isozh_TWen_US
dc.title具有高氮含量氮化鎢蕭特基閘極接觸之HEMT氮化鎵電晶體及其製造方法zh_TW
dc.typePatentsen_US
dc.citation.patentcountryTWNzh_TW
dc.citation.patentnumber201110344zh_TW
Appears in Collections:Patents


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