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dc.contributor.author林鴻志en_US
dc.contributor.author蘇俊榮en_US
dc.contributor.author徐行徽en_US
dc.contributor.author李冠樟en_US
dc.date.accessioned2014-12-16T06:12:45Z-
dc.date.available2014-12-16T06:12:45Z-
dc.date.issued2010-05-01en_US
dc.identifier.govdocH01L021/336zh_TW
dc.identifier.govdocH01L029/772zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/103754-
dc.description.abstract一種具懸浮式奈米通道之電晶體結構與其製造方法,其包含有一基底;一位於基底上的側閘極;一覆蓋於基底與側閘極上的介電層;一位於側閘極之側邊的懸浮式奈米線通道,其與介電層間具有一氣隙;以及一源極電極與一汲極電極,其係設置於介電層上且分設於懸浮式奈米線通道的兩端。藉由側閘極之靜電力對懸浮式奈米線通道之吸附或分離,來達到快速改變等效側閘極介電層厚度,而使元件在開關狀態上快速切換或改變通道之起始電壓。zh_TW
dc.language.isozh_TWen_US
dc.title具懸浮式奈米通道之電晶體結構與其製造方法zh_TW
dc.typePatentsen_US
dc.citation.patentcountryTWNzh_TW
dc.citation.patentnumber201017769zh_TW
Appears in Collections:Patents


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