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dc.contributor.author張國明en_US
dc.contributor.author林稔杰en_US
dc.date.accessioned2014-12-16T06:12:59Z-
dc.date.available2014-12-16T06:12:59Z-
dc.date.issued2008-09-16en_US
dc.identifier.govdocH01L021/66zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/103955-
dc.description.abstract本發明揭露一種以半導體製程形成輻射熱測定儀元件的結構及方法。本發明利用簡單的製程步驟,以及溫度低於攝氏400度的互補式金氧半導體(Complementary Metal Oxide Semiconductor,CMOS)製程相容技術來實現具有高積集因子(Fill Factor)、高良率以及低製作成本的室溫輻射熱測定儀陣列,同時兼顧元件的整體熱特性表現,以及元件結構的完整性。zh_TW
dc.language.isozh_TWen_US
dc.title以半導體製程形成輻射熱測定儀元件的結構及方法zh_TW
dc.typePatentsen_US
dc.citation.patentcountryTWNzh_TW
dc.citation.patentnumber200837861zh_TW
Appears in Collections:Patents


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