Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 陳月枝 | en_US |
| dc.contributor.author | 陳振泰 | en_US |
| dc.contributor.author | 林亞玄 | en_US |
| dc.date.accessioned | 2014-12-16T06:13:30Z | - |
| dc.date.available | 2014-12-16T06:13:30Z | - |
| dc.date.issued | 2006-07-01 | en_US |
| dc.identifier.govdoc | G01N030/72 | zh_TW |
| dc.identifier.uri | http://hdl.handle.net/11536/104179 | - |
| dc.description.abstract | 本發明提供一種之不需外加基質、簡單快速且成本低廉的金屬氧化物輔助雷射脫附游離質譜法，其係包括(a)以具有光吸收能力的無機金屬氧化物做為雷射脫附游離質譜法中輔助分析樣品進行脫附游離的基材，及(b)以檸檬酸緩衝溶液做為提供分析樣品質子化的來源。 | zh_TW |
| dc.language.iso | zh_TW | en_US |
| dc.title | 金屬氧化物輔助雷射脫附游離質譜法 | zh_TW |
| dc.type | Patents | en_US |
| dc.citation.patentcountry | TWN | zh_TW |
| dc.citation.patentnumber | 200622241 | zh_TW |
| Appears in Collections: | Patents | |
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