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dc.contributor.authorWuen_US
dc.contributor.authorYewChung Sermonen_US
dc.contributor.authorLinen_US
dc.contributor.authorPeiYanen_US
dc.date.accessioned2014-12-16T06:14:40Z-
dc.date.available2014-12-16T06:14:40Z-
dc.date.issued2004-02-03en_US
dc.identifier.govdocH01L021/20zh_TW
dc.identifier.govdocH01L021/36zh_TW
dc.identifier.govdocH01L021/30zh_TW
dc.identifier.govdocH01L021/46zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/104845-
dc.description.abstractA method for transferring an epitaxy layer is provided. The method includes steps of (a) providing a first substrate, (b) forming a first epitaxy layer on the first substrate, (c) forming a masking layer having at least a pattern on the first epitaxy layer, (d) forming a second epitaxy layer on the masking layer, (e) bonding a second substrate to the second epitaxy layer, and (f) removing the masking layer and separating the second epitaxy layer from the first epitaxy layer, thereby the second epitaxy layer being transferred to the second substrate.zh_TW
dc.language.isozh_TWen_US
dc.titleMethod for transferring epitaxy layerzh_TW
dc.typePatentsen_US
dc.citation.patentcountryUSAzh_TW
dc.citation.patentnumber06686257zh_TW
Appears in Collections:Patents


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