完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Wang, Jyh-Liang | en_US |
dc.contributor.author | Lai, Yi-Sheng | en_US |
dc.contributor.author | Chiou, Bi-Shiou | en_US |
dc.contributor.author | Shye, Der-Chi | en_US |
dc.contributor.author | Hwang, Chuan-Chou | en_US |
dc.contributor.author | Cheng, Huang-Chung | en_US |
dc.date.accessioned | 2014-12-08T15:13:35Z | - |
dc.date.available | 2014-12-08T15:13:35Z | - |
dc.date.issued | 2007-08-01 | en_US |
dc.identifier.issn | 0022-0248 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1016/j.jcrysgro.2007.05.005 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/10486 | - |
dc.description.abstract | In this article, we report the effect of excimer laser annealing (ELA) on the characteristics of (Pb,Sr)TiO(3) (PSrT) films. The unirradiated and irradiated films are characterized by atomic force microscope (AFM), X-ray photoelectron spectroscopy, X-ray diffractometer (XRD), transmission electron microscopy (TEM), and electron energy loss spectroscopy (EELS). It is found that the crystallinity is improved and the oxygen content is increased by ELA. Besides, the surface morphology becomes rough after ELA. Moreover, PSrT films irradiated by ELA are found to increase the grain size near the surface. The material properties of unirradiated and irradiated films, as well as the characteristics of PSrT films irradiated with various laser pulses, will be explored in this study. (c) 2007 Elsevier B.V. All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Effects of accumulated laser pulses on (Pb,Sr)TiO(3) films post-excimer laser annealed at low temperatures | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1016/j.jcrysgro.2007.05.005 | en_US |
dc.identifier.journal | JOURNAL OF CRYSTAL GROWTH | en_US |
dc.citation.volume | 306 | en_US |
dc.citation.issue | 1 | en_US |
dc.citation.spage | 80 | en_US |
dc.citation.epage | 85 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
顯示於類別: | 期刊論文 |