完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | TSENG Ching-Ping | en_US |
dc.contributor.author | LIN Wei-Chih | en_US |
dc.date.accessioned | 2014-12-16T06:14:49Z | - |
dc.date.available | 2014-12-16T06:14:49Z | - |
dc.date.issued | 2014-04-10 | en_US |
dc.identifier.govdoc | B01D053/96 | zh_TW |
dc.identifier.uri | http://hdl.handle.net/11536/104927 | - |
dc.description.abstract | A high concentration H2S elimination system and a method using the same are disclosed. The system of the present invention comprises: a chemical H2S elimination module with a gas inlet, a gas outlet and a liquid outlet, wherein H2 S-containing gas is introduced into the chemical H2S elimination module; a reagent storage unit containing an oxidant; a liquid spray unit, wherein the oxidant contained in the reagent storage unit is introduced into the chemical H2S elimination module from the liquid inlet thereof through the liquid spray unit; a bio-regeneration unit comprising a microorganism to regenerate oxidant and connecting to the reagent storage unit; and a sulfur-removing module connecting to the liquid outlet of the chemical H2S elimination module. | zh_TW |
dc.language.iso | zh_TW | en_US |
dc.title | HIGH CONCENTRATION H2S ELIMINATION SYSTEM AND HIGH CONCENTRATION H2S ELIMINATION METHOD | zh_TW |
dc.type | Patents | en_US |
dc.citation.patentcountry | USA | zh_TW |
dc.citation.patentnumber | 20140099693 | zh_TW |
顯示於類別: | 專利資料 |