完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Huang, S. M. | en_US |
dc.contributor.author | Lee, T. C. | en_US |
dc.contributor.author | Akimoto, H. | en_US |
dc.contributor.author | Kono, K. | en_US |
dc.contributor.author | Lin, J. J. | en_US |
dc.date.accessioned | 2019-04-03T06:44:46Z | - |
dc.date.available | 2019-04-03T06:44:46Z | - |
dc.date.issued | 2007-07-27 | en_US |
dc.identifier.issn | 0031-9007 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1103/PhysRevLett.99.046601 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/10538 | - |
dc.description.abstract | We report the observation of strong electron dephasing in a series of disordered Cu93Ge4Au3 thin films. A very short electron dephasing time possessing very weak temperature dependence around 6 K, followed by an upturn with further decrease in temperature below 4 K, is found. The upturn is progressively more pronounced in more disordered samples. Moreover, a lnT-dependent, but high-magnetic-field-insensitive, resistance rise persisting from above 10 K down to 30 mK is observed in the films. These results suggest a nonmagnetic dephasing process which is stronger than any known mechanism and may originate from the coupling of conduction electrons to dynamic defects. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Observation of strong electron dephasing in highly disordered Cu93Ge4Au3 thin films | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1103/PhysRevLett.99.046601 | en_US |
dc.identifier.journal | PHYSICAL REVIEW LETTERS | en_US |
dc.citation.volume | 99 | en_US |
dc.citation.issue | 4 | en_US |
dc.citation.spage | 0 | en_US |
dc.citation.epage | 0 | en_US |
dc.contributor.department | 電子物理學系 | zh_TW |
dc.contributor.department | 物理研究所 | zh_TW |
dc.contributor.department | Department of Electrophysics | en_US |
dc.contributor.department | Institute of Physics | en_US |
dc.identifier.wosnumber | WOS:000248345800046 | en_US |
dc.citation.woscount | 19 | en_US |
顯示於類別: | 期刊論文 |