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dc.contributor.authorChen, Fang-Chungen_US
dc.contributor.authorChuang, Chiao-Shunen_US
dc.contributor.authorLin, Yung-Shengen_US
dc.date.accessioned2014-12-16T06:16:04Z-
dc.date.available2014-12-16T06:16:04Z-
dc.date.issued2007-09-20en_US
dc.identifier.govdocH01L029/94zh_TW
dc.identifier.govdocH01L029/76zh_TW
dc.identifier.govdocH01L031/00zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/105636-
dc.description.abstractA gate dielectric structure and an organic thin film transistor based thereon, wherein the gate dielectric structure comprises: an organic-inorganic composite layer and an organic insulation layer, and the gate dielectric structure is applied to an organic thin film transistor. As the organic-inorganic composite layer of the gate dielectric structure has an organic insulation matrix blended with inorganic surface-modified particles, it can achieve a high dielectric constant. Further, as the organic insulation layer can modify the surface of the organic-inorganic composite layer, not only the leakage current is reduced, but also the crystalline structure of the organic semiconductor layer becomes more orderly. Thus, the carrier mobility is raised, the current output of the element is increased, and the performance of the element is also greatly enhanced.zh_TW
dc.language.isozh_TWen_US
dc.titleGATE DIELECTRIC STRUCTURE AND AN ORGANIC THIN FILM TRANSISTOR BASED THEREONzh_TW
dc.typePatentsen_US
dc.citation.patentcountryUSAzh_TW
dc.citation.patentnumber20070215957zh_TW
Appears in Collections:Patents


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