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dc.contributor.authorHsu, Wensyangen_US
dc.contributor.authorShieh, Han-Pingen_US
dc.contributor.authorSun, Yi Tingen_US
dc.date.accessioned2014-12-16T06:16:16Z-
dc.date.available2014-12-16T06:16:16Z-
dc.date.issued2005-09-08en_US
dc.identifier.govdocG01J001/20zh_TW
dc.identifier.govdocG01C021/02zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/105733-
dc.description.abstractThe present invention relates to a Microelectro mechanical system structure. More specifically the invention relates to utilize a sacrificial layer to fabricate an air bearing structure, followed by forming an aperture, and reducing the aperture to nano-scale by electroplating. And then, by using of two thick film photoresist films for twice electroplating fabrication, for fabricate metal microcoils having high aspect ratio structure and interconnection metal line, to achieve efficiencies of utilizing area and reducing resistance. Moreover, proceed lithography depends on different portions and exposure dose. Then form a single photoresist film to have a specific dimension and thickness structure, finally, by using reflow process, forming a magneto-optic (MO) pickup head comprises of Supersphere Solid Immersion Lens (SSIL), nano-aperture, microcoils and air bearing by using an integrated fabrication, with advantages such as no high cost device and precise apparatus are required in the process of fabrication, mass production in batch fabrication, without step of assembly, for high-density data storage and rewritable record.zh_TW
dc.language.isozh_TWen_US
dc.titleMicroelectro mechanical system for magneto-optic data storage apparatuszh_TW
dc.typePatentsen_US
dc.citation.patentcountryUSAzh_TW
dc.citation.patentnumber20050194515zh_TW
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