METHOD FOR TRANSFERRING EPITAXY LAYER

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DC Field	Value	Language
dc.contributor.author	YewChung, Wu	en_US
dc.contributor.author	PeiYan, Lin	en_US
dc.date.accessioned	2014-12-16T06:16:19Z	-
dc.date.available	2014-12-16T06:16:19Z	-
dc.date.issued	2004-01-22	en_US
dc.identifier.govdoc	H01L021/30	zh_TW
dc.identifier.govdoc	H01L021/46	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/105782	-
dc.description.abstract	A method for transferring an epitaxy layer is provided. The method includes steps of (a) providing a first substrate, (b) forming a first epitaxy layer on the first substrate, (c) forming a masking layer having at least a pattern on the first epitaxy layer, (d) forming a second epitaxy layer on the masking layer, (e) bonding a second substrate to the second epitaxy layer, and (f) removing the masking layer and separating the second epitaxy layer from the first epitaxy layer, thereby the second epitaxy layer being transferred to the second substrate.	zh_TW
dc.language.iso	zh_TW	en_US
dc.title	METHOD FOR TRANSFERRING EPITAXY LAYER	zh_TW
dc.type	Patents	en_US
dc.citation.patentcountry	USA	zh_TW
dc.citation.patentnumber	20040014297	zh_TW
Appears in Collections:	Patents

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