完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | YewChung, Wu | en_US |
dc.contributor.author | PeiYan, Lin | en_US |
dc.date.accessioned | 2014-12-16T06:16:19Z | - |
dc.date.available | 2014-12-16T06:16:19Z | - |
dc.date.issued | 2004-01-22 | en_US |
dc.identifier.govdoc | H01L021/30 | zh_TW |
dc.identifier.govdoc | H01L021/46 | zh_TW |
dc.identifier.uri | http://hdl.handle.net/11536/105782 | - |
dc.description.abstract | A method for transferring an epitaxy layer is provided. The method includes steps of (a) providing a first substrate, (b) forming a first epitaxy layer on the first substrate, (c) forming a masking layer having at least a pattern on the first epitaxy layer, (d) forming a second epitaxy layer on the masking layer, (e) bonding a second substrate to the second epitaxy layer, and (f) removing the masking layer and separating the second epitaxy layer from the first epitaxy layer, thereby the second epitaxy layer being transferred to the second substrate. | zh_TW |
dc.language.iso | zh_TW | en_US |
dc.title | METHOD FOR TRANSFERRING EPITAXY LAYER | zh_TW |
dc.type | Patents | en_US |
dc.citation.patentcountry | USA | zh_TW |
dc.citation.patentnumber | 20040014297 | zh_TW |
顯示於類別: | 專利資料 |